Discrete memristive levels and logic gate applications of Nb2O5 devices

被引:30
作者
Aziz, Jamal [1 ,2 ]
Kim, Honggyun [1 ]
Rehman, Shania [1 ]
Kadam, Kalyani D. [1 ,2 ]
Patil, Harshada [1 ,2 ]
Aftab, Sikandar [3 ]
Khan, Muhammad Farooq [1 ]
Kim, Deok-kee [1 ,2 ]
机构
[1] Sejong Univ, Dept Elect Engn, 209 Neungdong Ro, Seoul 05006, South Korea
[2] Sejong Univ, Dept Convergence Engn Intelligent Drone, Seoul 05006, South Korea
[3] Simon Fraser Univ, Dept Engn, Burnaby, BC, Canada
关键词
Multi-level cell; Single-level cell; Forming-free; Reactive electrode; Inert electrode and interfacial oxide layer; MEMORY; RERAM; ZRO2;
D O I
10.1016/j.jallcom.2021.160385
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Controlled resistive switching behavior has shown potential for brain-inspired functionalities and feasibility for multi-functional photelectric sensors. For the first time, bias-polarity dependent switching characteristic is observed in forming-free W/Nb2O5/(Pt, ITO) sandwiched structures. When voltage bias was applied to the W electrode, a multi-level cell (MLC) with more than two switching states was observed while a single-level (SLC) with binary switching states was observed with Pt or ITO biasing electrode. Moreover, devices with Pt electrodes exhibit higher SET voltages (>1) while devices with ITO electrodes exhibit lower SET voltages (<1) owing to mobile Sn4+ ions in the ITO electrodes which would absorb some oxygen ions and speed up the oxidation process during filament formation. Here MLC is attributed to the formation probability of multiple tiny filaments within interfacial layers arising from the interfacial oxygen ion migration between the W top electrode and Nb2O5 films. Moreover, implementation of Boolean logic functions using Nb2O5 films paves step towards commercialization of related logic circuits. (c) 2021 Elsevier B.V. All rights reserved.
引用
收藏
页数:9
相关论文
共 60 条
[1]   Chemical Nature of Electrode and the Switching Response of RF-Sputtered NbOx Films [J].
Aziz, Jamal ;
Kim, Honggyun ;
Rehman, Shania ;
Khan, Muhammad Farooq ;
Kim, Deok-kee .
NANOMATERIALS, 2020, 10 (11) :1-11
[2]   Influence of oxygen content of room temperature TiO2-x deposited films for enhanced resistive switching memory performance [J].
Bousoulas, P. ;
Michelakaki, I. ;
Tsoukalas, D. .
JOURNAL OF APPLIED PHYSICS, 2014, 115 (03)
[3]   Forming-free colossal resistive switching effect in rare-earth-oxide Gd2O3 films for memristor applications [J].
Cao, Xun ;
Li, Xiaomin ;
Gao, Xiangdong ;
Yu, Weidong ;
Liu, Xinjun ;
Zhang, Yiwen ;
Chen, Lidong ;
Cheng, Xinhong .
JOURNAL OF APPLIED PHYSICS, 2009, 106 (07)
[4]   Electric-Field-Induced Resistive Switching in a Family of Mott Insulators: Towards a New Class of RRAM Memories [J].
Cario, Laurent ;
Vaju, Cristian ;
Corraze, Benoit ;
Guiot, Vincent ;
Janod, Etienne .
ADVANCED MATERIALS, 2010, 22 (45) :5193-+
[5]   Research on Temperature Effect in Insulator-Metal Transition Selector Based on NbOx Thin Films [J].
Chen, Ao ;
Ma, Guokun ;
He, Yuli ;
Chen, Qin ;
Liu, Chunlei ;
Wang, Hao ;
Chang, Ting-Chang .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (12) :5448-5452
[6]   Bipolar resistive switching characteristics of atomic layer deposited Nb2O5 thin films for nonvolatile memory application [J].
Chen, Lin ;
Sun, Qing-Qing ;
Gu, Jing-Jing ;
Xu, Yan ;
Ding, Shi-Jin ;
Zhang, David Wei .
CURRENT APPLIED PHYSICS, 2011, 11 (03) :849-852
[7]   An Ultrathin Forming-Free HfOx Resistance Memory With Excellent Electrical Performance [J].
Chen, Yu-Sheng ;
Lee, Heng-Yuan ;
Chen, Pang-Shiu ;
Wu, Tai-Yuan ;
Wang, Ching-Chiun ;
Tzeng, Pei-Jer ;
Chen, Frederick ;
Tsai, Ming-Jinn ;
Lien, Chenhsin .
IEEE ELECTRON DEVICE LETTERS, 2010, 31 (12) :1473-1475
[8]  
Chien W. C., 2010, 2010 IEEE International Electron Devices Meeting (IEDM 2010), DOI 10.1109/IEDM.2010.5703390
[9]   Multilevel Bipolar Electroforming-Free Resistive Switching Memory Based on Silicon Oxynitride [J].
Das, Nayan C. ;
Oh, Se-I ;
Rani, Jarnardhanan R. ;
Hong, Sung-Min ;
Jang, Jae-Hyung .
APPLIED SCIENCES-BASEL, 2020, 10 (10)
[10]  
Dean JA., 1992, Lange's Handbook of Chemistry, V14