Hydrogen blistering of silicon: Progress in fundamental understanding

被引:109
|
作者
Terreault, Bernard [1 ]
机构
[1] Univ Quebec, Inst Natl Rech Sci Energie Mat & Telecommun, Varennes, PQ J3X 1S2, Canada
关键词
SINGLE-CRYSTAL SILICON; IMPLANTED SI; LAYER TRANSFER; INDUCED PLATELETS; ION-IMPLANTATION; INFRARED-ABSORPTION; INDUCED EXFOLIATION; THERMAL EVOLUTION; LATTICE LOCATION; MOLECULAR H-2;
D O I
10.1002/pssa.200622520
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
When silicon is implanted with a sufficient concentration of H ions, at low to moderate temperature, and subsequently annealed at high temperature, dome-shaped gas-filled blisters and/or craters of exploded blisters appear on the surface. Under particular conditions, blistering can be produced by plasma hydrogenation as well. The phenomenon is another facet of hydrogen behaviour in silicon, a question with both fundamental and applied implications. Blistering is at the origin of the "ion-cutting" process for the fabrication of silicon-on-insulator and other heterostructures; this process is particularly useful whenever atomically sharp interfaces between layers are required. The novelty and vast potential of this process has spurred since the mid-1990's a burst of experimental activity on blistering. The purposes of those works were either to improve or extend the ion-cut process, or to clarify its underlying mechanisms. In "mechanisms", the plural is used to convey the fact that it is a multi-step phenomenon. Because of this complexity, the theoretical work, in comparison, is far less abundant. Hydrogen blistering of silicon is qualitatively understood in broad terms: H being insoluble in Si, it tends to segregate into cavities which grow and coalesce at high temperature, and the H-2 pressure in the cavities finally deforms the surface. In fact, our understanding of the microscopic mechanisms has progressed much beyond that level thanks to the sophisticated work that has been carried out using techniques such as transmission electron microscopy, Rutherford backscattering in the channelling mode, infrared spectroscopy of local vibrational modes, stress and strain measurements, and others. The effects of n- or p-doping, He ion coimplantation, and isotope substitution have also greatly helped in discriminating between different hypotheses. After a review of the most relevant experimental facts, the blistering mechanisms that have been proposed in the literature will be discussed and their conformity with the data assessed. Finally an attempt will be made to identify the key questions and suggest a few avenues for future work.
引用
收藏
页码:2129 / 2184
页数:56
相关论文
共 50 条
  • [21] Hydrogen in silicon: Fundamental properties and consequences for devices
    Van de Walle, CG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (03): : 1767 - 1771
  • [22] The Influence Of Silicon Orientation On Surface Blistering Behaviors For Molecular Hydrogen Ion Implantation
    Hsiao, Y. C.
    Liang, J. H.
    Lin, C. M.
    CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2011 (CSTIC 2011), 2011, 34 (01): : 1159 - 1164
  • [23] Some aspects of blistering and exfoliation of helium-hydrogen coimplanted (100) silicon
    Corni, F
    Tonini, R
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 186 : 349 - 354
  • [24] Silicon orientation effects on surface blistering characteristics due to hydrogen ion implantation
    Liang, J. H.
    Hu, C. H.
    Lin, C. M.
    SURFACE & COATINGS TECHNOLOGY, 2011, 206 (05): : 820 - 824
  • [25] UNDERSTANDING ROLE OF HYDROGEN IN AMORPHOUS SILICON
    BRODKSY, MH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C302 - C302
  • [26] UNDERSTANDING THE ROLE OF HYDROGEN IN AMORPHOUS SILICON
    BRODSKY, MH
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1979, 24 (03): : 353 - 353
  • [27] RECENT PROGRESS IN THE UNDERSTANDING OF CRYSTALLOGRAPHIC DEFECTS IN SILICON
    CLAEYS, C
    VANHELLEMONT, J
    JOURNAL OF CRYSTAL GROWTH, 1993, 126 (01) : 41 - 62
  • [28] Recent progress in understanding oxygen precipitation in silicon
    Vanhellemont, J
    Esfandyari, J
    Obermeier, G
    Dornberger, E
    Graf, D
    Lambert, U
    Kissinger, G
    HIGH PURITY SILICON V, 1998, 98 (13): : 101 - 124
  • [29] Recent progress in the fundamental understanding of hydrophilic interaction chromatography (HILIC)
    Guo, Yong
    ANALYST, 2015, 140 (19) : 6452 - 6466
  • [30] Recent Progress in Understanding the Properties of the Amorphous Silicon/Crystalline Silicon Interface
    Kleider, Jean-Paul
    Alvarez, Jose
    Bruggemann, Rudolf
    Gueunier-Farret, Marie-Estelle
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2019, 216 (13):