Hydrogen blistering of silicon: Progress in fundamental understanding

被引:109
|
作者
Terreault, Bernard [1 ]
机构
[1] Univ Quebec, Inst Natl Rech Sci Energie Mat & Telecommun, Varennes, PQ J3X 1S2, Canada
关键词
SINGLE-CRYSTAL SILICON; IMPLANTED SI; LAYER TRANSFER; INDUCED PLATELETS; ION-IMPLANTATION; INFRARED-ABSORPTION; INDUCED EXFOLIATION; THERMAL EVOLUTION; LATTICE LOCATION; MOLECULAR H-2;
D O I
10.1002/pssa.200622520
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
When silicon is implanted with a sufficient concentration of H ions, at low to moderate temperature, and subsequently annealed at high temperature, dome-shaped gas-filled blisters and/or craters of exploded blisters appear on the surface. Under particular conditions, blistering can be produced by plasma hydrogenation as well. The phenomenon is another facet of hydrogen behaviour in silicon, a question with both fundamental and applied implications. Blistering is at the origin of the "ion-cutting" process for the fabrication of silicon-on-insulator and other heterostructures; this process is particularly useful whenever atomically sharp interfaces between layers are required. The novelty and vast potential of this process has spurred since the mid-1990's a burst of experimental activity on blistering. The purposes of those works were either to improve or extend the ion-cut process, or to clarify its underlying mechanisms. In "mechanisms", the plural is used to convey the fact that it is a multi-step phenomenon. Because of this complexity, the theoretical work, in comparison, is far less abundant. Hydrogen blistering of silicon is qualitatively understood in broad terms: H being insoluble in Si, it tends to segregate into cavities which grow and coalesce at high temperature, and the H-2 pressure in the cavities finally deforms the surface. In fact, our understanding of the microscopic mechanisms has progressed much beyond that level thanks to the sophisticated work that has been carried out using techniques such as transmission electron microscopy, Rutherford backscattering in the channelling mode, infrared spectroscopy of local vibrational modes, stress and strain measurements, and others. The effects of n- or p-doping, He ion coimplantation, and isotope substitution have also greatly helped in discriminating between different hypotheses. After a review of the most relevant experimental facts, the blistering mechanisms that have been proposed in the literature will be discussed and their conformity with the data assessed. Finally an attempt will be made to identify the key questions and suggest a few avenues for future work.
引用
收藏
页码:2129 / 2184
页数:56
相关论文
共 50 条
  • [1] Onset of blistering in hydrogen-implanted silicon
    Huang, LJ
    Tong, QY
    Chao, YL
    Lee, TH
    Martini, T
    Gösele, U
    APPLIED PHYSICS LETTERS, 1999, 74 (07) : 982 - 984
  • [2] Blistering and splitting in hydrogen-implanted silicon
    Ntsoenzok, E
    Assaf, H
    Ashok, S
    Semiconductor Defect Engineering-Materials, Synthetic Structures and Devices, 2005, 864 : 405 - 409
  • [4] Role of strain in the blistering of hydrogen-implanted silicon
    Lee, Jung-Kun
    Lin, Yuan
    Jia, Q. X.
    Hochbauer, Tobias
    Jung, Hyun Suk
    Shao, Lin
    Misra, Amit
    Nastasi, Michael
    APPLIED PHYSICS LETTERS, 2006, 89 (10)
  • [5] Behavior of implanted hydrogen in thermally stimulated blistering in silicon
    Aleksandrov, PA
    Baranova, EK
    Baranova, IV
    Budaragin, VV
    Litvinov, VL
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2003, 158 (11-12): : 771 - 781
  • [6] Kinetic evolution of blistering in hydrogen-implanted silicon
    Coupeau, C.
    Parry, G.
    Colin, J.
    David, M. -L.
    Labanowski, J.
    Grilhe, J.
    APPLIED PHYSICS LETTERS, 2013, 103 (03)
  • [7] A model for blistering and splitting of hydrogen silicon and its application to silicon-on-quartz
    Huang, LJ
    Tong, QY
    Lee, TH
    Chao, YL
    Gosele, UM
    SILICON MATERIALS SCIENCE AND TECHNOLOGY, VOLS 1 AND 2, 1998, : 1373 - 1384
  • [8] Blistering of silicon crystals by low keV hydrogen and helium ions
    Qian, C.
    Terreault, B.
    1600, American Institute of Physics Inc. (90):
  • [9] Effect of pressure and stress on blistering induced by hydrogen implantation in silicon
    Coupeau, C.
    Dion, E.
    David, M. -L.
    Colin, J.
    Grilhe, J.
    EPL, 2010, 92 (01)
  • [10] Blistering of silicon crystals by low keV hydrogen and helium ions
    Qian, C
    Terreault, B
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (10) : 5152 - 5158