Low-pressure planar magnetron discharge for surface deposition and nanofabrication

被引:20
作者
Baranov, Oleg [1 ]
Romanov, Maxim [1 ]
Wolter, Matthias [2 ]
Kumar, Shailesh [3 ,4 ]
Zhong, Xiaoxia [5 ]
Ostrikov, Kostya [3 ,5 ,6 ]
机构
[1] Natl Aerosp Univ KhAI, UA-61070 Kharkov, Ukraine
[2] Univ Kiel, Inst Expt & Appl Phys, D-24098 Kiel, Germany
[3] CSIRO Mat Sci & Engn, PNCA, Lindfield, NSW 2070, Australia
[4] Univ Ulster, Nanotechnol & Integrated BioEngn Ctr, Newtownabbey BT37 0QB, North Ireland
[5] Shanghai Jiao Tong Univ, Dept Phys, State Key Lab Adv Opt Commun Syst & Networks, Shanghai 200240, Peoples R China
[6] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
基金
中国国家自然科学基金; 澳大利亚研究理事会;
关键词
discharges (electric); nanofabrication; plasma deposition; plasma simulation; LOW-FREQUENCY; CARBON NANOTUBES; PLASMA; WAVES; EMISSION; THRUSTER; DENSITY; GROWTH; STATE;
D O I
10.1063/1.3431098
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Current-voltage characteristics of the planar magnetron are studied experimentally and by numerical simulation. Based on the measured current-voltage characteristics, a model of the planar magnetron discharge is developed with the background gas pressure and magnetic field used as parameters. The discharge pressure was varied in a range of 0.7-1.7 Pa, the magnetic field of the magnetron was of 0.033-0.12 T near the cathode surface, the discharge current was from 1 to 25 A, and the magnetic field lines were tangential to the substrate surface in the region of the magnetron discharge ignition. The discharge model describes the motion of energetic secondary electrons that gain energy by passing the cathode sheath across the magnetic field, and the power required to sustain the plasma generation in the bulk. The plasma electrons, in turn, are accelerated in the electric field and ionize effectively the background gas species. The model is based on the assumption about the prevailing Bohm mechanism of electron conductivity across the magnetic field. A criterion of the self-sustained discharge ignition is used to establish the dependence of the discharge voltage on the discharge current. The dependence of the background gas density on the current is also observed from the experiment. The model is consistent with the experimental results. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3431098]
引用
收藏
页数:9
相关论文
共 52 条
[1]  
Anders A., 2000, HDB PLASMA IMMERSION
[2]  
[Anonymous], 1984, CHEN
[3]   Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma [J].
Arnoult, G. ;
Belmonte, T. ;
Henrion, G. .
APPLIED PHYSICS LETTERS, 2010, 96 (10)
[4]   A model of a large-area planar plasma producer based on surface wave propagation in a plasma-metal structure with a dielectric sheath [J].
Azarenkov, NA ;
Denisenko, IB ;
Ostrikov, KN .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (12) :2465-2469
[5]   Discharge parameters and dominant electron conductivity mechanism in a low-pressure planar magnetron discharge [J].
Baranov, O. ;
Romanov, M. ;
Ostrikov, Kostya .
PHYSICS OF PLASMAS, 2009, 16 (06)
[6]   Low frequency oscillations in a stationary plasma thruster [J].
Boeuf, JP ;
Garrigues, L .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) :3541-3554
[7]  
Bohm D., 1949, CHARACTERISTICS ELEC
[8]   Study of the plasma pre-sheath in magnetron discharges dominated by Bohm diffusion of electrons [J].
Bradley, JW .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (04) :572-580
[9]   Introduction to gas discharges [J].
Braithwaite, NSJ .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04) :517-527
[10]   Deterministic plasma-aided synthesis of high-quality nanoislanded nc-SiC films [J].
Cheng, Qijin ;
Xu, S. ;
Long, Jidong ;
Ostrikov, Kostya .
APPLIED PHYSICS LETTERS, 2007, 90 (17)