Deep-ultraviolet stimulated emission from AlGaN/AlN multiple-quantum-wells on nano-patterned AlN/sapphire templates with reduced threshold power density

被引:11
作者
Chen, Xiang [1 ,2 ]
Zhang, Yun [1 ,2 ,3 ,4 ]
Yan, Jianchang [1 ,3 ,4 ]
Guo, Yanan [1 ,2 ]
Zhang, Shuo [1 ,2 ]
Wang, Junxi [1 ,2 ,3 ,4 ]
Li, Jinmin [1 ,2 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Res & Dev Ctr Solid State Lighting, Beijing 100083, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Beijing Engn Res Ctr 3rd Generat Semicond Mat & A, Beijing, Peoples R China
[4] State Key Lab Solid State Lighting, Beijing 100083, Peoples R China
基金
国家重点研发计划;
关键词
Nano-patterned substrate; Nanoscale ELOG; Nitride materials; AlN; UV LD; HIGH-QUALITY ALN; SAPPHIRE; EFFICIENCY;
D O I
10.1016/j.jallcom.2017.06.240
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We first report deep-ultraviolet (DUV) stimulated emission by optical pumping of AlGaN/AlN multiple-quantum-wells (MQWs) on nano-patterned AlN/sapphire (NP-AlN/sapphire) templates with significant threshold power density (P-th) reduction. Thanks to nanoscale lateral overgrowth on nano-holes patterns, the full width at half-maximum values of (0002) and (10 (1) over bar2) X-ray diffraction rocking curves of the NPAlN/sapphire template are 85 and 338 arcsec, deducing 71% less threading dislocations than the planar AlN/sapphire template. AlGaN/AlN MQWs on the NP-AlN/sapphire template exhibit DUV stimulated emission at 271.9 nm with spectral linewidth of 0.66 nm and P-th of 810 kW/cm(2), 68% lower compared to the same MQWs structure on a traditional planar AlN/sapphire template. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:192 / 196
页数:5
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