Growth and characterisation of ferromagnetic and antiferromagnetic Fe2+xVyAI Heusler alloy films

被引:6
作者
Huminiuc, Teodor [1 ]
Whear, Oliver [1 ]
Takahashi, Tomoyuki [2 ]
Kim, Jun-young [1 ]
Vick, Andrew [1 ]
Vallejo-Fernandez, Gonzalo [1 ]
O'Grady, Kevin [1 ]
Hirohata, Atsufumi [3 ]
机构
[1] Univ York, Dept Phys, York YO10 5DD, N Yorkshire, England
[2] Nagaoka Univ Technol, Dept Mat Sci & Technol, Nagaoka, Niigata 9402188, Japan
[3] Univ York, Dept Elect Engn, York YO10 5DD, N Yorkshire, England
基金
英国工程与自然科学研究理事会; 欧盟第七框架计划;
关键词
Heusler alloys; spintronics; sputtering; x-ray diffraction; Fe(2)VAI; antiferromagnet; exchange bias; EXCHANGE BIAS; THIN-FILMS; X-RAY; FE2VAL; DIFFRACTION;
D O I
10.1088/1361-6463/aacf4c
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated growth, annealing conditions and magnetic properties of the Heusler alloy Fe2+xVyAl by means of x-ray diffraction, magnetic hysteresis and exchange-bias measurements. Ferromagnetic Heusler alloy films were obtained by sputtering Fe2VAl and Fe3VAl targets and performing post-growth annealing. The characteristic (220) Heusler alloy peaks were seen in the x-ray diffraction measurements and corresponding ferromagnetic behaviours were observed. In addition, antiferromagnetic Heusler alloy films were deposited by employing Al pegs on Fe3VAl sputtering targets. The deposited films had elemental ratios close to the predicted Fe2.5V0.5Al phase, and a 16 Oe exchange-bias was measured in a Fe2.3V0.7Al/Co60Fe40 system at 100K.
引用
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页数:5
相关论文
共 24 条
[11]   NMR and X-ray (100) and (110) diffraction lines in L21-type Fe2VSi [J].
Kawakami, M ;
Yamaguchi, K ;
Shinohara, T .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1999, 68 (06) :2128-2131
[12]   Structural, thermal, and electronic properties of Fe2VSi1-xAlx -: art. no. 064202 [J].
Lue, CS ;
Kuo, YK ;
Horng, SN ;
Peng, SY ;
Cheng, C .
PHYSICAL REVIEW B, 2005, 71 (06)
[13]   NEW MAGNETIC ANISOTROPY [J].
MEIKLEJOHN, WH ;
BEAN, CP .
PHYSICAL REVIEW, 1957, 105 (03) :904-913
[14]  
Nayak AK, 2015, NAT MATER, V14, P679, DOI [10.1038/NMAT4248, 10.1038/nmat4248]
[15]   Semiconductorlike behavior of electrical resistivity in Heusler-type Fe2VAl compound [J].
Nishino, Y ;
Kato, M ;
Asano, S ;
Soda, K ;
Hayasaki, M ;
Mizutani, U .
PHYSICAL REVIEW LETTERS, 1997, 79 (10) :1909-1912
[16]   A new paradigm for exchange bias in polycrystalline thin films [J].
O'Grady, K. ;
Fernandez-Outon, L. E. ;
Vallejo-Fernandez, G. .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2010, 322 (08) :883-899
[17]   INVESTIGATION OF FE3-XVXAL ALLOYS WITH DO3 TYPE-STRUCTURE BY X-RAY, MAGNETOSTATIC AND MOSSBAUER-EFFECT METHODS [J].
POPIEL, E ;
TUSZYNSKI, M ;
ZAREK, W ;
RENDECKI, T .
JOURNAL OF THE LESS-COMMON METALS, 1989, 146 (1-2) :127-135
[18]   Effect of Seed Layers on Polycrystalline Co2FeSi Thin Films [J].
Sagar, J. ;
Yu, C. ;
Pelter, C. ;
Wood, J. ;
Lari, L. ;
Hirohata, A. ;
O'Grady, K. .
IEEE TRANSACTIONS ON MAGNETICS, 2012, 48 (11) :4006-4009
[19]   DETECTION OF ANTIFERROMAGNETISM BY NEUTRON DIFFRACTION [J].
SHULL, CG ;
SMART, JS .
PHYSICAL REVIEW, 1949, 76 (08) :1256-1257
[20]   Electronic structure, local moments, and transport in Fe2VAl [J].
Singh, DJ ;
Mazin, II .
PHYSICAL REVIEW B, 1998, 57 (22) :14352-14356