Photoreaction of aromatic compounds at α-FeOOH/H2O interface in the presence of H2O2:: evidence for organic-goethite surface complex formation

被引:69
作者
He, J
Ma, WH
Song, WJ
Zhao, JC [1 ]
Qian, XH
Zhang, SB
Yu, JC
机构
[1] Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Lab Photochem, Beijing 100080, Peoples R China
[2] PetroChina Co Ltd, Fushun Petrochem Co, Liaoning 113008, Peoples R China
[3] Chinese Univ Hong Kong, Dept Chem, Shatin, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
aromatic compounds; alpha-FeOOH; photooxidation; H2O2; UV;
D O I
10.1016/j.watres.2004.09.006
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The photoreactions of aromatic compounds were investigated in aqueous dispersions of alpha-FeOOH(goethite)/H2O2 at neutral pHs. It was found that aromatic compounds could undergo rapid decomposition and mineralization (even to 100% yield) in the presence of both alpha-FeOOH and H2O2 under UV irradiation, and the degradation rates of the organics were related to their sorption ability of the surface of alpha-FeOOH and were in the following order: salicylic acid, approximate to m-hydroxylbenzoic acid > p-hydroxylbenzoic acid approximate to benzoic acid > p-biphthalic acid > phenol > benzenesulfonic acid. The interactions of salicylic acid and benzenesulfonic acid with goethite were examined by Fourier transform infrared spectroscopy (FTIR), and electron spin resonance (ESR) was applied to detect the intermediate radicals formed in the photoreaction. The effect of pH and foreign ligands on the degradation of salicylic acid, decomposition of H2O2, and formation of dissolved iron was also examined. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:119 / 128
页数:10
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