Atomic Layer Deposition of Cobalt Catalyst for Fischer-Tropsch Synthesis in Silicon Microchannel Microreactor

In recent years, rising environmental concerns have led to the focus on some of the innovative alternative technologies to produce clean burning fuels. Fischer-Tropsch (FT) synthesis is one of the alternative chemical processes to produce synthetic fuels, which has a current research focus on reactor and catalyst improvements. In this work, a cobalt nanofilm (similar to 4.5 nm), deposited by the atomic layer deposition (ALD) technique in a silicon microchannel microreactor (2.4 cm long x 50 mu m wide x 100 mu m deep), was used as a catalyst for atmospheric Fischer-Tropsch (FT) synthesis. The catalyst film was characterized by XPS, TEM-EDX, and AFM studies. The data from AFM and TEM clearly showed the presence of polygranular cobalt species on the silicon wafer. The XPS studies of as-deposited and reduced cobalt nanofilm in silicon microchannels showed a shift on the binding energies of Co 2p spin splits and confirmed the presence of cobalt in the Co-0 chemical state for FT synthesis. The FT studies using the microchannel microreactor were carried out at two different temperatures, 240 degrees C and 220 degrees C, with a syngas (H-2:CO) molar ratio of 2:1. The highest CO conversion of 74% was observed at 220 degrees C with the distribution of C-1-C-4 hydrocarbons. The results showed no significant selectivity towards butane at the higher temperature, 240 degrees C. The deactivation studies were performed at 220 degrees C for 60 h. The catalyst exhibited long-term stability, with only similar to 13% drop in the CO conversion at the end of 60 h. The deactivated cobalt film in the microchannels was investigated by XPS, showing a weak carbon peak in the XPS spectra.