Optimization of the conditions for vacuum thermal deposition of bismuth films with control of their imperfection by atomic force microscopy

被引：19

作者：

Grabov, V. M. ^{[1
]}

Demidov, E. V. ^{[1
]}

Komarov, V. A. ^{[1
]}

机构：

[1] Herzen Russian State Pedag Univ, St Petersburg 191186, Russia

来源：

PHYSICS OF THE SOLID STATE | 2010年 / 52卷 / 06期

关键词：

Crystallite Size; Substrate Temperature; Deposition Rate; Mutual Orientation; Mica Substrate;

D O I：

10.1134/S1063783410060284

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The structure and defects of bismuth films prepared through vacuum thermal deposition on mica substrates under different conditions (deposition rates, substrate temperatures, temperatures and times of annealing) have been investigated using atomic force microscopy. The conditions are determined under which recrystallization occurs with increasing crystallite size during annealing, which provides a decrease in the degree of imperfection of the films and an increase in the mobility of charge carriers.

引用

页码：1298 / 1302

页数：5

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