Interfacial-layer modulation of domain switching current in ferroelectric thin films

被引:34
作者
Jiang, A. Q. [1 ]
Lin, Y. Y. [1 ]
Tang, T. A. [1 ]
机构
[1] Fudan Univ, Dept Microelect, ASIC & Syst State Key Lab, Shanghai 200433, Peoples R China
关键词
D O I
10.1063/1.2733640
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is found that the voltage drop across a 170-nm-thick Pb(Zr(0.4)Ti(0.6))O(3) film keeps constantly at a well-defined coercive voltage during domain switching, irrespective of the applied voltage and frequency, and that the switching current of domains is reversely proportional to the resistance of loading resistors in the circuit. A simple formalism is derived for the speed of polarization reversal short into a few nanoseconds. The maximum speed of domain switching is limited by the time of compensation charge dissipation via loading resistors in the circuit, instead of reverse domain nucleation and growth. However, in most cases, the switching current decays with time and is thus peaked under different applied voltages, as observed in an 87-nm-thick film. This phenomenon is understood from our work due to the presence of interfacial passive layers that modulate switching current transient through the circuit RC-time constant, besides the consideration of a broad coercive-voltage distribution in a genuine thin film.
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页数:5
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[21]   Driving force behind voltage shifts in ferroelectric materials [J].
Warren, WL ;
AlShareef, HN ;
Dimos, D ;
Tuttle, BA ;
Pike, GE .
APPLIED PHYSICS LETTERS, 1996, 68 (12) :1681-1683