Interfacial-layer modulation of domain switching current in ferroelectric thin films

被引:34
作者
Jiang, A. Q. [1 ]
Lin, Y. Y. [1 ]
Tang, T. A. [1 ]
机构
[1] Fudan Univ, Dept Microelect, ASIC & Syst State Key Lab, Shanghai 200433, Peoples R China
关键词
D O I
10.1063/1.2733640
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is found that the voltage drop across a 170-nm-thick Pb(Zr(0.4)Ti(0.6))O(3) film keeps constantly at a well-defined coercive voltage during domain switching, irrespective of the applied voltage and frequency, and that the switching current of domains is reversely proportional to the resistance of loading resistors in the circuit. A simple formalism is derived for the speed of polarization reversal short into a few nanoseconds. The maximum speed of domain switching is limited by the time of compensation charge dissipation via loading resistors in the circuit, instead of reverse domain nucleation and growth. However, in most cases, the switching current decays with time and is thus peaked under different applied voltages, as observed in an 87-nm-thick film. This phenomenon is understood from our work due to the presence of interfacial passive layers that modulate switching current transient through the circuit RC-time constant, besides the consideration of a broad coercive-voltage distribution in a genuine thin film.
引用
收藏
页数:5
相关论文
共 21 条
[1]   Ferroelectricity at the nanoscale: Local polarization in oxide thin films and heterostructures [J].
Ahn, CH ;
Rabe, KM ;
Triscone, JM .
SCIENCE, 2004, 303 (5657) :488-491
[2]   Can interface dislocations degrade ferroelectric properties? [J].
Alpay, SP ;
Misirlioglu, IB ;
Nagarajan, V ;
Ramesh, R .
APPLIED PHYSICS LETTERS, 2004, 85 (11) :2044-2046
[3]   Thickness dependence of the switching voltage in all-oxide ferroelectric thin-film capacitors prepared by pulsed laser deposition [J].
Cillessen, JFM ;
Prins, MWJ ;
Wolf, RM .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (06) :2777-2783
[4]   Interface-related decrease of the permittivity in PbZrxTi1-xO3 thin films [J].
Grossmann, M ;
Lohse, O ;
Bolten, D ;
Boettger, U ;
Schneller, T ;
Waser, R .
APPLIED PHYSICS LETTERS, 2002, 80 (08) :1427-1429
[5]   Direct studies of domain switching dynamics in thin film ferroelectric capacitors [J].
Gruverman, A ;
Rodriguez, BJ ;
Dehoff, C ;
Waldrep, JD ;
Kingon, AI ;
Nemanich, RJ ;
Cross, JS .
APPLIED PHYSICS LETTERS, 2005, 87 (08)
[6]   STUDY OF D-E HYSTERESIS LOOP OF TGS BASED ON THE AVRAMI-TYPE MODEL [J].
HASHIMOTO, S ;
ORIHARA, H ;
ISHIBASHI, Y .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1994, 63 (04) :1601-1610
[7]   A MODEL OF POLARIZATION REVERSAL IN FERROELECTRICS [J].
ISHIBASHI, Y .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1990, 59 (11) :4148-4154
[8]  
Ishibashi Y., 1971, J PHYS SOC JPN, V31, P505
[9]   Studies of switching kinetics in ferroelectric thin films [J].
Jiang, A ;
Dawber, M ;
Scott, JF ;
Wang, C ;
Migliorato, P ;
Gregg, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (11) :6973-6982
[10]   NANOSECOND SWITCHING OF THIN FERROELECTRIC-FILMS [J].
LARSEN, PK ;
KAMPSCHOER, GLM ;
ULENAERS, MJE ;
SPIERINGS, GACM ;
CUPPENS, R .
APPLIED PHYSICS LETTERS, 1991, 59 (05) :611-613