Polysilicon thin layers for photovoltaic applications

被引：0

作者：

Budianu, E ^{[1
]}

Purica, M ^{[1
]}

Rusu, E ^{[1
]}

Manea, E ^{[1
]}

Gavrila, R ^{[1
]}

机构：

[1] Natl Inst Res & Dev Microtechnol, Bucharest 72225, Romania

来源：

CAS: 2002 INTERNATIONAL SEMICONDUCTOR CONFERENCE, VOLS 1 AND 2, PROCEEDINGS | 2001年

关键词：

photovoltaic cell; thin film; polysilicon;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin layers of polycrystalline silicon as the optically absorbing material for photovoltaic devices represents a promising way. for simultaneously achieving of good performances and low manufacturing cost. In this paper, the preparation of polysilicon thin layers together with technological process for a p-i-n typed photovoltaic cell fabrication are presented. The crystalline structure, surface morphology and optical properties were investigated by AFM technique, X-ray diffraction and spectrophotometer measurements.

引用

页码：215 / 218

页数：4

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