Silver migration and trapping in ion implanted ZnO single crystals

被引:12
作者
Azarov, Alexander [1 ]
Vines, Lasse [1 ]
Rauwel, Protima [1 ]
Monakhov, Edouard [1 ]
Svensson, Bengt G. [1 ]
机构
[1] Univ Oslo, Dept Phys, Ctr Mat Sci & Nanotechnol, POB 1048 Blindern, N-0316 Oslo, Norway
关键词
P-TYPE ZNO; STOICHIOMETRIC DISTURBANCES; COMPOUND SEMICONDUCTORS; ZINC-OXIDE; STABILITY; AG;
D O I
10.1063/1.4949331
中图分类号
O59 [应用物理学];
学科分类号
摘要
Potentially, group-Ib elements (Cu, Ag, and Au) incorporated on Zn sites can be used for p-type doping of ZnO, and in the present paper, we use ion implantation to introduce Ag atoms in wurtzite ZnO single crystals. Monitoring the Li behavior, being a residual impurity in the crystals, as a tracer, we demonstrate that Zn interstitials assist the Ag diffusion and lead to Ag pile-up behind the implanted region after annealing above 800 degrees C. At even higher temperatures, a pronounced Ag loss from the sample surface occurs and concurrently the Ag atoms exhibit a trap-limited diffusion into the crystal bulk with an activation energy of similar to 2.6 eV. The dominant traps are most likely Zn vacancies and substitutional Li atoms, yielding substitutional Ag atoms. In addition, formation of an anomalous multipeak Ag distribution in the implanted near-surface region after annealing can be attributed to local implantation-induced stoichiometry disturbances leading to trapping of the Ag atoms by O and Zn vacancies in the vicinity of the surface and in the end-of-range region, respectively. Published by AIP Publishing.
引用
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页数:5
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