Effect of the substrate temperature on zirconium oxynitride thin films deposited by water vapour-nitrogen radiofrequency magnetron sputtering

被引：16
|
作者：
Signore, M. A. [1 ]
Rizzo, A. [1 ]
Tapfer, L. [1 ]
Piscopiello, E. [1 ]
Capodieci, L. [1 ]
Cappello, A. [1 ]
机构：
[1] ENEA, UTS FIM, CR Brindisi, I-72100 Brindisi, Italy
来源：
THIN SOLID FILMS | 2010年 / 518卷 / 08期
关键词：
Zirconium oxynitride; Atomic Force Microscopy; X-ray diffraction; Secondary Ion Mass Spectrometry; Transmission Electron Microscopy; Magnetron sputtering; NITRIDATION; HYDROGEN;
D O I：
10.1016/j.tsf.2009.07.153
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
ZrNx films were deposited by radiofrequency reactive magnetron sputtering technique in nitrogen and water vapour atmosphere varying the working temperature from room temperature to 600 degrees C. The films' physical properties were investigated using X-ray diffraction, Secondary Ion Mass Spectroscopy, Atomic Force Microscopy and Transmission Electron Microscopy. It was found that the increase of temperature caused a decrease in the oxygen incorporation and a transition from cubic phase Of Zr2ON2 to ZrN one. The formation of nanosized crystalline particles dispersed in the amorphous matrix was observed. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：1943 / 1946
页数：4
相关论文
共 50 条
  • [41] Effect of bias on the structure and properties of TiZrN thin films deposited by unbalanced magnetron sputtering
    Lin, Yu-Wei
    Chen, Hsi-An
    Yu, Ge-Ping
    Huang, Jia-Hong
    THIN SOLID FILMS, 2016, 618 : 13 - 20
  • [42] Characterization of carbon nitride thin films deposited by reactive dc magnetron sputtering on various substrate materials
    Zheng, WT
    Hellgren, N
    Sjostrom, H
    Sundgren, JE
    SURFACE & COATINGS TECHNOLOGY, 1998, 100 (1-3) : 287 - 290
  • [43] Effect of the formation conditions on the properties of ZnO:Ga thin films deposited by magnetron-assisted sputtering onto a cold substrate
    Gromov, D. G.
    Koz'min, A. M.
    Shulyat'ev, A. S.
    Polomoshnov, S. A.
    Bogolyubova, D. N.
    Shamanaev, S. V.
    SEMICONDUCTORS, 2013, 47 (13) : 1687 - 1691
  • [44] Effect of the formation conditions on the properties of ZnO:Ga thin films deposited by magnetron-assisted sputtering onto a cold substrate
    D. G. Gromov
    A. M. Koz’min
    A. S. Shulyat’ev
    S. A. Polomoshnov
    D. N. Bogolyubova
    S. V. Shamanaev
    Semiconductors, 2013, 47 : 1687 - 1691
  • [45] Influence of Nitrogen on Corrosion Resistance of Thin Ti–O–N Films Deposited by Reactive Magnetron Sputtering
    E. L. Boytsova
    F. A. Voroshilov
    L. A. Leonova
    Inorganic Materials: Applied Research, 2021, 12 : 1033 - 1036
  • [46] Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering
    Du, Mingjun
    Wu, Zhiming
    Luo, Zhenfei
    Xu, Xiangdong
    Yu, Junsheng
    Jiang, Yadong
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
  • [47] Effect of Buffer Layer Growth Temperature on Epitaxial GaN Films Deposited by Magnetron Sputtering
    Mohanta, P.
    Singh, D.
    Kumar, R.
    Ganguli, T.
    Srinivasa, R. S.
    Major, S. S.
    SOLID STATE PHYSICS, PTS 1 AND 2, 2012, 1447 : 661 - +
  • [48] Low-temperature deposited Titanium-doped zinc oxide thin films on the flexible PET substrate by DC magnetron sputtering
    Liu, Hanfa
    Lei, Chengxin
    VACUUM, 2011, 86 (04) : 483 - 486
  • [49] Effect of sputtering pressure on the properties of large area IWO thin films deposited by direct current magnetron sputtering
    Yu, Tianyu
    Jiang, Yunlei
    Liang, Suxia
    Zhao, Zhiguo
    Zou, Sheng
    Su, Jie
    Hua, Renjie
    Liang, Cang
    Chen, Wangfan
    Zhang, Mi
    Zhang, Wenjun
    Shi, Lei
    Dong, Yuan
    CURRENT APPLIED PHYSICS, 2024, 64 : 1 - 7
  • [50] Effect of Ar ion-beam-assistance and substrate temperature on physical properties of Al-doped ZnO thin films deposited by RF magnetron sputtering
    Sreedhar, Adem
    Kwon, Jin Hyuk
    Yi, Jonghoon
    Gwag, Jin Seog
    MATERIALS RESEARCH BULLETIN, 2017, 95 : 451 - 458
12345