Point defects in hexagonal silicon

被引:6
|
作者
Sun, Lin [1 ]
Marques, Mario R. G. [2 ]
Marques, Miguel A. L. [2 ,3 ]
Botti, Silvana [1 ,3 ]
机构
[1] Friedrich Schiller Univ Jena, Inst Festkorpertheorie & Opt, Max Wien Pl 1, D-07743 Jena, Germany
[2] Martin Luther Univ Halle Wittenberg, Inst Phys, D-06120 Halle, Saale, Germany
[3] European Theoret Spect Facil, Liege, Belgium
基金
欧盟地平线“2020”;
关键词
TOTAL-ENERGY CALCULATIONS; AB-INITIO; ELECTRONIC-PROPERTIES; STRUCTURE PREDICTIONS; COMPLEX CRYSTALLINE; AMORPHOUS PHASES; GE; SI; INTERFACES; FORM;
D O I
10.1103/PhysRevMaterials.5.064605
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The importance of hexagonal Lonsdaleite silicon-germanium has been growing lately due to its possible uses in optoelectronic devices. However, very little is known about defects in the hexagonal phases of group-IV semiconductors. We extend here an efficient constrained structure prediction algorithm designed for interface reconstructions to the study of point defect geometries. With this method we perform an exhaustive structure prediction study of the most energetically favorable intrinsic defects in Lonsdaleite silicon. We obtain among the lowest-energy structures the hexagonal counterparts of all known defects of cubic silicon, together with other often more complex geometries. Neutral vacancies, fourfold-coordinated, and Frenkel defects have comparable formation energies in both hexagonal and cubic phases, while some interstitial defects become considerably more stable in the hexagonal lattice. Furthermore, due to the reduced symmetry, formation energies can depend on the orientation of the defect with respect to the c axis. Finally, we calculate the density of states of the defective supercells to determine which defects lead to electronic states in the band gap, potentially affecting the performance of optoelectronic devices based on hexagonal group-IV crystals.
引用
收藏
页数:9
相关论文
共 50 条
  • [1] Stress and doping impact on intrinsic point defects in silicon and germanium
    Vanhellemont, Jan
    Kamiyama, Eiji
    Sueoka, Koji
    INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS 2013, 2014, 1583 : 8 - 12
  • [2] Hexagonal Silicon Realized
    Hauge, Hakon Ikaros T.
    Verheijen, Marcel A.
    Conesa-Boj, Sonia
    Etzelstorfer, Tanja
    Watzinger, Marc
    Kriegner, Dominik
    Zardo, Ilaria
    Fasolato, Claudia
    Capitani, Francesco
    Postorino, Paolo
    Kolling, Sebastian
    Li, Ang
    Assali, Simone
    Stangl, Julian
    Bakkers, Erik P. A. M.
    NANO LETTERS, 2015, 15 (09) : 5855 - 5860
  • [3] Oxygen and silicon point defects in Al0.65Ga0.35N
    Harris, Joshua S.
    Gaddy, Benjamin E.
    Collazo, Ramon
    Sitar, Zlatko
    Irving, Douglas L.
    PHYSICAL REVIEW MATERIALS, 2019, 3 (05):
  • [4] The trapping effects of silicon and phosphorus on point defects in ?-Fe
    Cao, Jinli
    Wu, Shi
    Zhu, Heyu
    Liu, Ziran
    Dou, Yankun
    Yang, Wen
    Huang, Chen
    He, Xinfu
    COMPUTATIONAL MATERIALS SCIENCE, 2022, 210
  • [5] Recombination via point defects and their complexes in solar silicon
    Peaker, A. R.
    Markevich, V. P.
    Hamilton, B.
    Parada, G.
    Dudas, A.
    Pap, A.
    Don, E.
    Lim, B.
    Schmidt, J.
    Yu, L.
    Yoon, Y.
    Rozgonyi, G.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2012, 209 (10): : 1884 - 1893
  • [6] Point Defects in Hexagonal SiP Monolayer: A Systematic Investigation on the Electronic and Magnetic Properties
    Ha, Chu Viet
    Ponce-Perez, R.
    Guerrero-Sanchez, J.
    Hoat, D. M.
    ADVANCED THEORY AND SIMULATIONS, 2024, 7 (06)
  • [7] Hexagonal silicon-germanium nanowire branches with tunable composition
    Li, A.
    Hauge, H. I. T.
    Verheijen, M. A.
    Bakkers, E. P. A. M.
    Tucker, R. T.
    Vincent, L.
    Renard, C.
    NANOTECHNOLOGY, 2023, 34 (01)
  • [8] Point defects generated by direct-wafer bonding of silicon
    L. Dózsa
    B. Szentpáli
    D. Pasquariello
    K. Hjort
    Journal of Electronic Materials, 2002, 31 : 113 - 118
  • [9] Point defects generated by direct-wafer bonding of silicon
    Dózsa, L
    Szentpáli, B
    Pasquariello, D
    Hjort, K
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (02) : 113 - 118
  • [10] A topological point defect regulates the evolution of extended defects in irradiated silicon
    Park, Hyoungki
    Wilkins, John W.
    APPLIED PHYSICS LETTERS, 2011, 98 (17)