Investigation of Cu-Sn-Se material for high-speed phase-change memory applications

被引:17
|
作者
You, Haipeng [1 ]
Hu, Yifeng [1 ]
Zhu, Xiaoqin [1 ]
Zou, Hua [1 ]
Song, Sannian [2 ]
Song, Zhitang [2 ]
机构
[1] Jiangsu Univ Technol, Sch Math & Phys, Changzhou 213000, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
关键词
THIN-FILMS; LOW-POWER; ULTRAFAST;
D O I
10.1007/s10854-017-6784-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cu-Sn-Se material was prepared by magnetron sputtering to investigate its potential application in phase change memory. The amorphous-to-crystalline transition was studied by in situ film resistance measurements. Cu-Sn-Se material had lower activation energy for crystallization (1.60 eV) and higher crystallization resistance than SnSe. The amorphous Cu-Sn-Se had more narrow band gap compared to SnSe. After the adding of Cu, the crystallization of Cu-Sn-Se material was inhibited and the grain structure became more compact. The picosecond laser pulse measurement indicated that Cu-Sn-Se material had a fast phase change speed (3.36 ns). The results demonstrated that Cu-Sn-Se material was a promising phase change material which had low power and high speed application in phase change memory.
引用
收藏
页码:10199 / 10204
页数:6
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