Total reflection X-ray photoelectron spectroscopy: A review

被引：12

作者：

Kawai, Jun ^{[1
]}

机构：

[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2010年 / 178卷

关键词：

Total reflection; X-ray photoelectron spectroscopy; Grazing incidence; Glancing incidence; SI WAFER SURFACE; PHOTOEMISSION-SPECTROSCOPY; ANGULAR-DISTRIBUTIONS; THICKNESS MEASUREMENTS; FLUORESCENCE ANALYSIS; OXIDIZED GAAS(100); ANGLE; MULTILAYER; SILICON; DIFFRACTION;

D O I：

10.1016/j.elspec.2009.12.001

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Total reflection X-ray photoelectron spectroscopy (TRXPS) is reviewed and all the published papers on TRXPS until the end of 2009 are included. Special emphasis is on the historical development. Applications are also described for each report. The background reduction is the most important effect of total reflection, but interference effect, relation to inelastic mean free path, change of probing depth are also discussed. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：268 / 272

页数：5

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