Maximizing the thermoelectric performance of topological insulator Bi2Te3 films in the few-quintuple layer regime

被引:62
作者
Liang, Jinghua [1 ,2 ]
Cheng, Long [1 ,2 ]
Zhang, Jie [1 ,2 ]
Liu, Huijun [1 ,2 ]
Zhang, Zhenyu [3 ,4 ]
机构
[1] Wuhan Univ, Key Lab Artificial Micro & Nanostruct, Minist Educ, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China
[3] Univ Sci & Technol China, Int Ctr Quantum Design Funct Mat, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China
[4] Univ Sci & Technol China, Synerget Innovat Ctr Quantum Informat & Quantum P, Hefei 230026, Anhui, Peoples R China
关键词
TOTAL-ENERGY CALCULATIONS; SINGLE DIRAC CONE; SURFACE-STATES; FIGURE;
D O I
10.1039/c6nr00724d
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Using first-principles calculations and the Boltzmann theory, we explore the feasibility to maximize the thermoelectric figure of merit (ZT) of topological insulator Bi2Te3 films in the few-quintuple layer regime. We discover that the delicate competitions between the surface and bulk contributions, coupled with the overall quantum size effects, lead to a novel and generic non-monotonous dependence of ZT on the film thickness. In particular, when the system crosses into the topologically non-trivial regime upon increasing the film thickness, the much longer surface relaxation time associated with the robust nature of the topological surface states results in a maximal ZT value, which can be further optimized to similar to 2.0 under physically realistic conditions. We also reveal the appealing potential of bridging the long-standing ZT asymmetry of p-and n-type Bi2Te3 systems.
引用
收藏
页码:8855 / 8862
页数:8
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