Systematic theoretical investigations of adsorption behavior on the GaAs(001)-c(4 x 4) surfaces

被引:18
作者
Ito, T
Tsutsumida, K
Nakamura, K
Kangawa, Y
Shiraishi, K
Taguchi, A
Kageshima, H
机构
[1] Mie Univ, Dept Engn Phys, Tsu, Mie 5148507, Japan
[2] Tokyo Univ Agr & Technol, Dept Appl Chem, Tokyo 1848588, Japan
[3] Univ Tsukuba, Dept Phys, Tsukuba, Ibaraki 3058271, Japan
[4] Natl Inst Adv Ind Sci & Technol, Res Consortium Synthet Nanofunct Mat Project, AIST, Tsukuba, Ibaraki 3058568, Japan
[5] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
关键词
GaAs surfaces; reconstruction; adsorption behavior; adatom migration; ab initio calculations;
D O I
10.1016/j.apsusc.2004.06.125
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Adsorption behavior on the GaAs(0 0 1)-c(4 x 4) surfaces is systematically investigated by using our ab initio-based approach and the Monte Carlo methods. The change in stable structure of the c(4 x 4) surfaces is clarified by considering adsorption or desorption of surface dimers as functions of temperature and As pressure. The calculated results imply that the c(4 x 4) surface with As dimers is stable at low temperatures less than similar to400 K, whereas the surface with Ga-As dimers is stabilized at high temperatures in the range of similar to400-700 K. The disordered dimer arrangements consisting of Ga and As substituted by each other in the c(4 x 4) unit cell hardly appear even at high temperatures such as similar to800 K. We also investigate the behavior of Ga and As adatoms on these c(4 x 4) surfaces. The calculated results reveal that Ga atoms can adsorb and migrate on the surfaces while desorption of As adatoms proceeds without sufficient migration. Therefore, Ga adatoms play an important role for the epitaxial growth of GaAs on the GaAs(0 0 1)-c(4 x 4) surface. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:194 / 199
页数:6
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