Simultaneous multi-channel absolute position alignment by multi-order grating interferometry

被引:12
作者
Tao, Zhang [1 ]
Cui, Jiwen [1 ]
Tan, Jiubin [1 ]
机构
[1] Harbin Inst Technol, D-405 Sci Pk,2 Yikuang St, Harbin 150080, Peoples R China
基金
中国国家自然科学基金;
关键词
MOIRE FRINGE; PROXIMITY LITHOGRAPHY; SYSTEM; PERFORMANCE; DISTANCE; DESIGN;
D O I
10.1364/OE.24.000802
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A simultaneous multi-channel absolute position alignment system is investigated to determine the absolute position of a grating mark. By employing a multi-order grating interferometer and a multi-channel phase extraction method, many equivalent measurement results are generated simultaneously for stable and consistent measurement. By combining measurement results of different orders, low-order signals enabled large unambiguous measurement ranges, and high-order signals enhanced the measurement accuracy. Comparison experiments performed using an incremental HeNe reference interferometer yielded the standard deviations of smaller than 11.48nm under laboratory conditions. The proposed scheme will enable a new class of absolute position alignment system for industrial applications. (C) 2016 Optical Society of America
引用
收藏
页码:802 / 816
页数:15
相关论文
共 24 条
[1]   Optical methods for distance and displacement measurements [J].
Berkovic, Garry ;
Shafir, Ehud .
ADVANCES IN OPTICS AND PHOTONICS, 2012, 4 (04) :441-471
[2]   AUTOMATIC ALIGNMENT SYSTEM FOR OPTICAL PROJECTION PRINTING [J].
BOUWHUIS, G ;
WITTEKOEK, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :723-728
[3]   NEW INTERFEROMETRIC ALIGNMENT TECHNIQUE [J].
FLANDERS, DC ;
SMITH, HI ;
AUSTIN, S .
APPLIED PHYSICS LETTERS, 1977, 31 (07) :426-428
[4]   A review of nanometer resolution position sensors: Operation and performance [J].
Fleming, Andrew J. .
SENSORS AND ACTUATORS A-PHYSICAL, 2013, 190 :106-126
[5]   Method for acquiring the characteristic parameter of the dual-spiral moire fringes [J].
Huang, Lei ;
Su, Xianyu .
OPTICS LETTERS, 2008, 33 (08) :872-874
[6]   Diffracted moire fringes as analysis and alignment tools for multilayer fabrication in soft lithography [J].
Lee, JH ;
Kim, CH ;
Kim, YS ;
Ho, KM ;
Constant, K ;
Leung, W ;
Oh, CH .
APPLIED PHYSICS LETTERS, 2005, 86 (20) :1-3
[7]   Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics [J].
Leibovici, Matthieu C. R. ;
Burrow, Guy M. ;
Gaylord, Thomas K. .
OPTICS EXPRESS, 2012, 20 (21) :23643-23652
[8]   Recent developments and challenges of nanopositioning and nanomeasuring technology [J].
Manske, Eberhard ;
Jaeger, Gerd ;
Hausotte, Tino ;
Fuessl, Roland .
MEASUREMENT SCIENCE AND TECHNOLOGY, 2012, 23 (07)
[9]   Extended ATHENA™ alignment performance and application for the 100 nm technology node [J].
Navarro, R ;
Keij, S ;
den Boef, A ;
Schets, S ;
van Bilsen, F ;
Simons, G ;
Schuurhuis, R ;
Burghoorn, J .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XV, 2001, 4344 :682-694
[10]   Diode-laser-based high-precision absolute distance interferometer of 20 m range [J].
Pollinger, Florian ;
Meiners-Hagen, Karl ;
Wedde, Martin ;
Abou-Zeid, Ahmed .
APPLIED OPTICS, 2009, 48 (32) :6188-6194