Electron beam nanoprocessing of a carbon nanotube film using a variable pressure scanning electron microscope

被引:0
作者
Niitsuma, Jun-ichi
Sekiguchi, Takashi
Yuan, Xiao-Li
Awano, Yuji
机构
[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050044, Japan
[2] Japan Sci & Technol Agcy, ICORP, Nanoscale Quantum Conductor Array Project, Kawaguchi, Saitama 3320012, Japan
[3] Fujitsu Ltd, Atsugi, Kanagawa 2430197, Japan
[4] Fujitsu Labs Ltd, Nanotechnol Res Ctr, Atsugi, Kanagawa 2430197, Japan
关键词
variable-pressure SEM; environmental SEM; carbon nanotube; electron beam; nanoprocessing;
D O I
10.1166/jnn.2007.420
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate a novel method of processing carbon nanotubes using a variable pressure scanning electron microscope. Lines were processed in a nanotube film by electron beam irradiation in oxygen gas and nitrogen gas. The processing mechanism can be explained in terms of gas ion sputtering and chemical reaction. In this experiment, the narrowest line width of 120 nm was achieved in a nitrogen atmosphere.
引用
收藏
页码:2356 / 2360
页数:5
相关论文
共 21 条
[1]   An investigation of the electron irradiation of carbon blacks in various gas atmospheres using a modified electron microscope [J].
Burden, AP ;
Baigrie, S ;
Hutchison, JL .
JOURNAL OF MICROSCOPY-OXFORD, 1998, 192 :7-19
[2]   Toward large-scale integration of carbon nanotubes [J].
Chung, JY ;
Lee, KH ;
Lee, JH ;
Ruoff, RS .
LANGMUIR, 2004, 20 (08) :3011-3017
[3]   A CARBON NANOTUBE FIELD-EMISSION ELECTRON SOURCE [J].
DEHEER, WA ;
CHATELAIN, A ;
UGARTE, D .
SCIENCE, 1995, 270 (5239) :1179-1180
[4]   The use of environmental scanning electron microscopy for imaging wet and insulating materials [J].
Donald, AM .
NATURE MATERIALS, 2003, 2 (08) :511-516
[5]   Growth of large periodic arrays of carbon nanotubes [J].
Huang, ZP ;
Carnahan, DL ;
Rybczynski, J ;
Giersig, M ;
Sennett, M ;
Wang, DZ ;
Wen, JG ;
Kempa, K ;
Ren, ZF .
APPLIED PHYSICS LETTERS, 2003, 82 (03) :460-462
[6]  
Kind H, 1999, ADV MATER, V11, P1285, DOI 10.1002/(SICI)1521-4095(199910)11:15<1285::AID-ADMA1285>3.0.CO
[7]  
2-J
[8]   Electron-beam induced etching of resist with water vapor as the etching medium [J].
KohlmannvonPlaten, KT ;
Bruenger, WH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4262-4266
[9]   Highly-ordered carbon nanotube arrays for electronics applications [J].
Li, J ;
Papadopoulos, C ;
Xu, JM ;
Moskovits, M .
APPLIED PHYSICS LETTERS, 1999, 75 (03) :367-369
[10]   On achieving better uniform carbon nanotube field emission by electrical treatment and the underlying mechanism [J].
Liang, XH ;
Deng, SZ ;
Xu, NS ;
Chen, J ;
Huang, NY ;
She, JC .
APPLIED PHYSICS LETTERS, 2006, 88 (11)