Controlled generation of Ni nanoparticles in the capping layers of Teflon AF by vapor-phase tandem evaporation

被引：62

作者：

Biswas, A

Marton, Z

Kanzow, J

Kruse, J

Zaporojtchenko, V

Faupel, F

Strunskus, T

机构：

[1] CAU, Tech Fak, Lehrstuhl Materialverbunde, D-24143 Kiel, Germany

[2] Ruhr Univ Bochum, Lehrstuhl Phys Chem 1, D-44780 Bochum, Germany

来源：

NANO LETTERS | 2003年 / 3卷 / 01期

关键词：

D O I：

10.1021/nl020228f

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A promising solvent-free route to vapor-phase tandem evaporation is employed to produce nanoclusters of reactive Ni protected between the capping layers of Teflon AF. Independent control over the homogeneously distributed particle size (similar to3-10 nm) is demonstrated while increasing the cluster-volume filling from similar to1 to 20% by following codeposition to many-sequential thermal evaporation of the two components. TEM investigations have been applied to characterize the nanocomposites.

引用

页码：69 / 73

页数：5

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