Chemical analysis of semiconducting and metallic SmS thin films by X-ray photoelectron spectroscopy

被引:19
作者
Mori, Yukimasa
Tanemura, Sakae
机构
[1] NGK Insulators Ltd, Mat Res Lab, Mizuho Ku, Nagoya, Aichi 4678530, Japan
[2] Nagoya Inst Technol, Showa Ku, Nagoya, Aichi 4668555, Japan
关键词
SmS thin film; semiconducting SmS; metallic SmS; Sm valence states; X-ray photoelectron spectroscopy;
D O I
10.1016/j.apsusc.2006.08.011
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We studied the chemical state of semiconducting and metallic SmS thin films by X-ray photoelectron spectroscopy (XPS), which were fabricated using dual-target magnetron sputtering by controlling the power applied to both metal and chalcogenide targets. On the basis of the valence band spectra obtained, it was suggested that semiconducting SmS has the final state corresponding to the Sm-2, (4f(6)) configuration below the Fermi level, and metallic SmS has mainly the Sm3+ (4f(5)) final state and a virtual band state in the Sm 5d band, contributing to the delocalization of 4f electrons and the emergence of metallic conductivity (4f(6)d(0)-4f(5)-d(1)). Thus, the spectra of our fabricated SmS thin films correspond to the band structure obtained from the dielectric property. This is the first work performed on the intrinsically prepared metallic SmS while the former works done for the sample transformed from semiconductor to metal phase by hard polishing. (c) 2006 Elsevier B.V. Ail rights reserved.
引用
收藏
页码:3856 / 3859
页数:4
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