Highly doped n-type silicon theoretical optimization

被引:0
|
作者
Stem, N [1 ]
Cid, M [1 ]
机构
[1] Univ Sao Paulo, Escola Politecn, Dept Engn Electron, Lab Microelectron, BR-05424970 Sao Paulo, Brazil
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Considering the recent modification of n-type highly doped silicon parameters [1], these work has been made based on one-dimensional models with analytical solutions [2,3]. In order to get a good accuracy, a fifth order approximation has been considered. Passivated emitters with gaussian profile of n(+)pp(+) solar cells were optimized. According to our results. emitter solar cells show their best efficiencies (eta similar or equal to 21.60 - 21.70 %) with N-s = 1 x 10(19) - 5 x 10(18) (cm(-3)) and (1.2 - 2.0)mu M emitter thickness range.
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页码:637 / 642
页数:6
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