Non-ablative femtosecond laser exposure of fused silica in the sub-50 fs regime (Conference Presentation)

被引：0
|
作者：
Block, Erica K. [1 ]
McMillen, Ben W. [1 ]
Nillon, Julien [2 ]
Honninger, Clemens [2 ]
Bellouard, Yves [1 ]
机构：
[1] Ecole Polytech Fed Lausanne, Lausanne, Switzerland
[2] Amplitude Syst, Pessac, France
来源：
FRONTIERS IN ULTRAFAST OPTICS: BIOMEDICAL, SCIENTIFIC, AND INDUSTRIAL APPLICATIONS XVII | 2017年 / 10094卷
关键词：
D O I：
10.1117/12.2256551
中图分类号：
R318 [生物医学工程];
学科分类号：
0831 ;
摘要：
引用
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页数：1
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