Fabrication of PbTiO3 Nanocrystals on Atomically Flat Sapphire Substrates by Sputtering

被引:0
作者
Nishida, Takashi [1 ]
Kubo, Koichi [1 ]
Echizen, Masahiro [1 ]
Takeda, Hiroaki [2 ]
Uchiyama, Kiyoshi [1 ]
Shiosaki, Tadashi [1 ]
机构
[1] Nara Inst Sci & Technol, Grad Sch Mat Sci, 8916-5 Takayama, Nara 6300101, Japan
[2] Tokyo Inst Technol, Grad Sch Sci & Engn, Tokyo 1528550, Japan
来源
ASIAN CERAMIC SCIENCE FOR ELECTRONICS III AND ELECTROCERAMICS IN JAPAN XII | 2010年 / 421-422卷
关键词
PbTiO3; lead titanate; PZT; thin film; nanocrystal; sputter; atomically flat sapphire; STRUCTURAL CONTROL; CAPACITORS; FILMS;
D O I
10.4028/www.scientific.net/KEM.421-422.502
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to perform the growth position control, PbTiO3 (x=0) (PTO) nanocrystals were deposited on atomically flat and non-atomically flat alpha-Al2O3 substrates by RF magnetron sputtering. The atomically flat substrates with atomic steps and terrace are expected to induce the lateral growth along a terrace between the surface steps. In the case of the atomically flat, the nanocrystals got lined up along the atomic steps, and uniform nanocrystals were obtained on surface in same pitch.
引用
收藏
页码:502 / +
页数:2
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