Optical characterization of improvement of carrier localization in InGaAsN/GaAs single quantum wells by addition of Sb flux to interfaces

被引:1
作者
Iguchi, Y.
Ishizuka, T.
Yamada, T.
Takagishi, S.
Nomura, K.
Nakayama, M.
机构
[1] Sumitomo Elect Ind Ltd, Transmiss Devices R&D Labs, Itami, Hyogo 6640016, Japan
[2] Osaka City Univ, Grad Sch Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
基金
日本学术振兴会;
关键词
photoluminescence; surfactant; metal organic vapor phase epitaxy; quantum wells; nitrides; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2006.10.070
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have investigated effects of a trimethylantimony (TMSb) flow to the interface between GaAs buffer layer and InGaAsN quantum-well layer on localization of carriers in InGaAsN/GaAs single quantum wells (SQWs) grown by metal organic vapor phase epitaxy from the viewpoint of photoluminescence (PL) properties. We also measured photo reflectance spectroscopy in order to determine the energy of the band-edge transition. The Stokes shift of the PL-peak energy under a weak excitation condition decreases from 20 meV in no TMSb flow to 15 meV in the TMSb flow of 5 x 10(-7) mol/min. The PL-decay time in the low-energy PL tail related to localized states is obviously shortened by the TMSb flow. The decay profiles detected at various energies can be explained by a stretched exponential form peculiar to disordered systems. The overall results of the PL characterization demonstrate that the carrier localization is reduced by the TMSb flow to the interface. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:540 / 543
页数:4
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