Study of substrate temperature effects on structural, optical, mechanical and opto-thermal properties of NiO sprayed semiconductor thin films

被引:52
作者
Boukhachem, A. [1 ]
Boughalmi, R. [1 ]
Karyaoui, M. [2 ]
Mhamdi, A. [2 ]
Chtourou, R. [2 ]
Boubaker, K. [1 ]
Amlouk, M. [1 ]
机构
[1] Tunis El Manar Univ, Fac Sci Tunis, Unite Phys Dispositifs Semicond, Tunis 2092, Tunisia
[2] Ctr Rech & Technol Energie, Lab Photovolta, Hammam Lif 2050, Tunisia
来源
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2014年 / 188卷
关键词
XRD; AFM; Thin films; NiO; P-TYPE NIO; ELECTROCHROMIC PROPERTIES; PARAMETERS; DEPOSITION; SENSOR;
D O I
10.1016/j.mseb.2014.06.001
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Crystalline nickel oxide (NiO) thin films were obtained by simple spray pyrolysis technique using nickel chloride hexahydrate solutions onto glass substrates at different temperatures of 350, 400 and 450 degrees C. Structures of the as-deposited NiO thin films have been investigated by X-ray diffraction (XRD) and the surface topography was performed by the atomic force microscope (AFM). The results show that NiO films crystallize in cubic phase structure with a preferred orientation of the crystallites along (1 1 1) direction. Furthermore, a conjoint new and original set of opto-thermal and hydrophobic investigations has been carried out and discussed relatively to the classically investigated structural, optical, mechanical and thermal characteristics, in order to compare optimized geometrical and crystalline structures. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:72 / 77
页数:6
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