Rational Design and Construction of Well-Organized Macro-Mesoporous SiO2/TiO2 Nanostructure toward Robust High-Performance Self-Cleaning Antireflective Thin Films

被引:48
作者
Jin, Binbin [1 ,2 ,3 ]
He, Junhui [1 ,2 ]
Yao, Lin [1 ,2 ]
Zhang, Yue [1 ,2 ]
Li, Jing [1 ,2 ]
机构
[1] Chinese Acad Sci, Ctr Micro Nanomat & Technol, Funct Nanomat Lab, Zhongguancundonglu 29, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Key Lab Photochem Convers & Optoelect Mat, Tech Inst Phys & Chem, Zhongguancundonglu 29, Beijing 100190, Peoples R China
[3] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
macro-mesoporous structure; SiO2/TiO2; thin film; antireflection; superhydrophilic; self-cleaning; robust; POROUS POLYMER-FILMS; ONE-STEP GROWTH; BROAD-BAND; OMNIDIRECTIONAL ANTIREFLECTION; MECHANICALLY ROBUST; SILICA NANOPARTICLES; DURABLE SUPERHYDROPHILICITY; FACILE FABRICATION; HIGH TRANSMITTANCE; PHASE-SEPARATION;
D O I
10.1021/acsami.7b04140
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Antireflection (AR) thin films on optical substrates are of great significance in high-performance a rational design and construction of well-organized macro-pollutant mesoporous nanostructure toward robust high-performance self-cleaning antireflective thin films on the basis of effective medium theory and finite difference time domain (FDTD) simulations that combine the optical design principle. A hierarchical macro-mesoporous SiO2 thin film with very high porosity and gradient refractive indexes works as a 2/4-wavelength AR layer and significantly suppresses the reflection in the range from 350 to 1200 nm. Even after dip-coating a layer of high refractive index TiO2 nanocrystals, the nanostructured thin film still exhibits broadband AR properties which are much superior to conventional flat SiO2/TiO2 thin films, especially in the range of 350-500 nm. In addition, the obtained thin film exhibits photocatalytic self-cleaning and durable sup erhydrophilicity. The advantages brought by the well-organized macro-mesoporous structure are also testified through comparing to the solely mesoporous SiO2/TiO2 film counterpart. Moreover, the pencil hardness test and sandpaper abrasion test show favorable robustness and functional durability of the thin film, which make it extremely attractive for practical applications in optical devices, display devices, and photovoltaic cells.
引用
收藏
页码:17467 / 17476
页数:10
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