A new model of DLA under high magnetic field

A new Monte Carlo model is introduced to describe diffusion-limited aggregation (DLA) with extra forces arising from Lorentz's and/or Coulomb forces. Furthermore, we simulate a behavior of multiparticle diffusive aggregation to examine the resultant pattern of crystal in electrochemical deposition. Different patterns grown under various external forces are produced by Monte Carlo simulations. In the present model, the basic movement of particles is a random walk, with different transition probabilities in different directions, which characterizes stochastically the effect of extra forces. In case of assuming a high magnetic field, pattern formations which an qualitatively different from the standard DLA model are observed and they are successfully compared with preexisting experiments (Mogi et al., 1991). The present numerical results of electrochemical deposition show that the generated patterns strongly depend on the force acting on ions and their concentration (Sawada et al., 1986). Copyright (C) 1998 Elsevier Science B.V.