UV photolysis of trichloroethylene: Product study and kinetic modeling

被引:41
作者
Li, K
Stefan, MI
Crittenden, JC
机构
[1] Arizona State Univ, Dept Civil & Environm Engn, Tempe, AZ 85281 USA
[2] Univ Western Ontario, Dept Chem, London, ON N6A 5B7, Canada
关键词
D O I
10.1021/es040304b
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Direct UV photolysis of trichloroethylene (TCE) in dilute aqueous solution generated chloride ions as a major end product and several reaction intermediates, such as formic acid, di- and monochloroacetic acids, glyoxyic acid, and, to a lesser extent, mono- and dichloroacetylene, formaldehyde, dichloroacetaldehyde, and oxalic acid. Under prolonged irradiation, these byproducts underwent photolysis, and a high degree of mineralization (similar to95%) was achieved. TCE decays through the following major pathways: (1) TCE + h(v) --> ClCH=(CCl)-Cl-. + Cl-.; (2) TCE (H2O) + hv --> ClCH(OH)-CHCl2; (3) TCE + hv --> HCequivalent toCCl + Cl-2; (4) TCE + hv --> ClCequivalent toCCl + HCl; (5) TCE + Cl-. --> C12HC_C*Cl2. A kinetic model was developed to simulate the destruction of TCE and the formation and fate of byproducts in aqueous solution under irradiation with polychromatic light. By fitting the experimental data, the quantum yields for the four photolysis steps were predicted as phi(1) = 0.13, phi(2) = 0.1, phi(3) = 0.032, and phi(4) = 0.092, respectively. The reaction mechanism proposed for the photodegradation of TCE accounts for all intermediates that were detected. The agreement between the computed and experimental patterns of TCE and reaction products is satisfactory given the complexity of the reaction mechanism and the lack of photolytic kinetic parameters that are provided in the literature.
引用
收藏
页码:6685 / 6693
页数:9
相关论文
共 50 条
[41]   Kinetic study and modeling of the vacuum-UV photoinduced degradation of 2,4-D [J].
Imoberdorf, Gustavo ;
Mohseni, Madjid .
CHEMICAL ENGINEERING JOURNAL, 2012, 187 :114-122
[42]   TUNABLE UV LASER PHOTOLYSIS OF ORGANOMETALLIC COMPOUNDS WITH PRODUCT DETECTION BY LASER MASS-SPECTROSCOPY [J].
BEUERMANN, T ;
STUKE, M .
LASER- AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES, 1989, 129 :79-84
[43]   Controlling Electronic Product Branching at Conical Intersections in the UV Photolysis of para-Substituted Thiophenols [J].
Oliver, Thomas A. A. ;
King, Graeme A. ;
Tew, David P. ;
Dixon, Richard N. ;
Ashfold, Michael N. R. .
JOURNAL OF PHYSICAL CHEMISTRY A, 2012, 116 (51) :12444-12459
[44]   TUNABLE UV LASER PHOTOLYSIS OF ORGANOMETALLICS WITH PRODUCT DETECTION BY LASER MASS-SPECTROSCOPY - TRIMETHYLALUMINUM [J].
BEUERMANN, T ;
STUKE, M .
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1989, 49 (02) :145-148
[45]   Aqueous photolysis of naproxen exposed to UV and natural sunlight: Formation of excited triplet and photosensitizing product [J].
Li, Xiaoci ;
Cai, Yan ;
Chen, Jing ;
Lu, Junhe ;
Chovelon, Jean-Marc ;
Zhou, Quansuo ;
Ji, Yuefei .
JOURNAL OF HAZARDOUS MATERIALS, 2024, 474
[46]   THE UV LASER PHOTOLYSIS OF STIBINE [J].
NI, TQ ;
YU, SQ ;
MA, XX ;
KONG, F .
CHEMICAL PHYSICS LETTERS, 1986, 128 (03) :270-273
[47]   PHOTOLYSIS OF PERFLUORIDATED IODOALKYLENE IN UV [J].
COMES, FJ ;
PIONTECK, S .
BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1978, 82 (11) :1243-1243
[48]   THE UV PHOTOLYSIS OF HYDRAZOIC ACID [J].
PIPER, LG ;
KRECH, RH ;
TAYLOR, RL .
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1980, 180 (AUG) :34-PHYS
[49]   THE UV PHOTOLYSIS AND RADIOLYSIS OF HYDROCARBONS [J].
SARAEVA, VV .
VESTNIK MOSKOVSKOGO UNIVERSITETA SERIYA 2 KHIMIYA, 1987, 28 (02) :131-137
[50]   VACUUM UV PHOTOLYSIS OF METHYLAMINE [J].
GARDNER, EP ;
MCNESBY, JR .
JOURNAL OF PHOTOCHEMISTRY, 1981, 17 (1-2) :184-184