Fully Current-Based Sub-Bandgap Optoelectronic Differential Ideality Factor Technique and Extraction of Subgap DOS in Amorphous Semiconductor TFTs

被引:21
作者
Bae, Hagyoul [1 ]
Seo, Hyojoon [2 ]
Jun, Sungwoo [2 ]
Choi, Hyunjun [2 ]
Ahn, Jaeyeop [2 ]
Hwang, Junseok [2 ]
Lee, Jungmin [2 ]
Oh, Saeroonter [3 ]
Bae, Jong-Uk [3 ]
Choi, Sung-Jin [2 ]
Kim, Dae Hwan [2 ]
Kim, Dong Myong [2 ]
机构
[1] Kookmin Univ, Seoul 136702, South Korea
[2] Kookmin Univ, Sch Elect Engn, Seoul 136702, South Korea
[3] LG Display Res & Dev Ctr, Paju 413811, South Korea
基金
新加坡国家研究基金会;
关键词
Amorphous oxide semiconductor; density-of-states (DOS); differential ideality factor; InGaZnO (IGZO); optoelectronic; subgap thin-film transistor (TFT); subthreshold; TFT; DENSITY-OF-STATES; CAPACITANCE;
D O I
10.1109/TED.2014.2348592
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A sub-bandgap optoelectronic differential ideality factor technique is proposed for extraction of the intrinsic density-of-states (DOS) over the bandgap in amorphous semiconductor thin-film transistors (TFTs). In the proposed technique, the gate bias-dependent differential change in the difference of ideality factors (d Delta eta(V-GS)/dV(GS)) between dark and sub-bandgap photonic excitation condition is employed. With the sub-bandgap photons (h nu < E-g), the photonic excitation of electrons is confined only from the localized DOS over the bandgap. We applied the proposed technique to a-InGaZnO TFTs with W/L = 50/25 mu m/mu m and extracted the energy distribution of the intrinsic DOS for the localized states over the bandgap.
引用
收藏
页码:3566 / 3569
页数:4
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