Early stage of tin oxide film growth in chemical vapor deposition

被引：21

作者：

Matsui, Y ^{[1
]}

Mitsuhashi, M ^{[1
]}

Goto, Y ^{[1
]}

机构：

[1] Asahi Glass Co Ltd, New Prod Dev Ctr, Fabr Glass Div, Kanagawa 2430301, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 169卷

关键词：

nucleation; atomic force microscopy; atmospheric pressure chemical vapor deposition; Tin oxide;

D O I：

10.1016/S0257-8972(03)00205-6

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Early stage of film growth was studied for chemical vapor deposition tin oxide films. Nucleation of films was observed by using an atomic force microscope. It was found nucleation structure of the crystallites changed from isolated island-like to tightly interconnected as methanol concentration into source gases increased. (C) 2003 Elsevier Science B.V. All tights reserved.

引用

页码：549 / 552

页数：4

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