Compositional and optical characterization of SiOx films deposited by ECR-PECVD for photonics applications

被引：0

作者：

Flynn, M ^{[1
]}

Irving, E ^{[1
]}

Roschuk, T ^{[1
]}

Wojcik, J ^{[1
]}

Mascher, P ^{[1
]}

机构：

[1] McMaster Univ, Ctr Electrophoton Mat & Devices, Hamilton, ON L8S 4L7, Canada

来源：

2004 IST IEEE INTERNATIONAL CONFERENCE ON GROUP IV PHOTONICS | 2004年

关键词：

D O I：

10.1109/GROUP4.2004.1416656

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Thin SiOX films were deposited using ECR-PECVD. The composition and structure of the samples was determined using Rutherford Backscattering and Fourier transform infrared spectroscopy while photoluminescence and ellipsometric measurements were used to characterize the samples optically. AFM measurements confirmed the presence of silicon nanocrystals after annealing the samples. These materials have the potential to be used in a variety of applications, including rare-earth doping, as well as their applicability to optical coatings because of the large achievable range of refractive indices.

引用

页码：69 / 71

页数：3

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