Far-infrared spectroscopy of shallow acceptors in semi-insulating GaAs: evidence for defect interactions with EL2

被引:3
作者
Alt, HC
Gomeniuk, Y
Kretzer, U
机构
[1] Munich Univ Appl Sci, FHM, D-80001 Munich, Germany
[2] Freiberger Compound Mat GmbH, D-09599 Freiberg, Germany
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2003年 / 235卷 / 01期
关键词
D O I
10.1002/pssb.200301533
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Far-infrared FTIR absorption measurements are carried out at 10 K in order to assess the uncompensated fraction of shallow acceptors in semi-insulating GaAs after optical bleaching of EL2. In carbon-doped material a linear correlation of the G line at 122.3 cm(-1) with the C-As, concentration is found in the whole concentration range between 1 x 10(14) and 2 x 10(16) cm(-3). In samples co-doped with zinc in the range around 1 x 10(16) cm(-3) and 1 to 2 x 10(15) cm(-3) carbon, both, Zn-Ga- and C-As-related far-infrared absorption lines are observed. Taking into consideration the Fermi level position after bleaching of EL2, it can be concluded that no other donors than EL2 are present above a total concentration of 1 x 10(15) cm(-3). In addition to the far-infrared measurements, the intracentre transition of EL2 (A(1) --> T-2) at 1.0389 eV is studied. The results are compatible only with an increase of the total EL2 concentration with the shallow acceptor concentration. Possible mechanisms for the interaction between shallow- and deep-level defects are discussed.
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页码:58 / 62
页数:5
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