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Kinetics study of antimony adsorption on Si(111)
被引:6
|作者:
Lapena, L
[1
]
Müller, P
[1
]
Quentel, G
[1
]
Guesmi, H
[1
]
Tréglia, G
[1
]
机构:
[1] Ctr Rech Mecanismes Croissance Cristalline, F-13288 Marseille 9, France
关键词:
adsorption kinetics;
reflection high-energy electron (RHEED);
ab initio quantum chemical methods and calculations;
thermal desorption;
antimony;
silicon;
D O I:
10.1016/S0169-4332(03)00414-8
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
In this paper, we use mass spectrometry (MS) and reflection high-energy electron (RHEED) to study the kinetics of adsorption of Sb on Si(1 1 1) surface and its relation to the corresponding surface structure. At high temperature (T > 800 degreesC) all the impinging Sb-4 molecules completely dissociate at the silicon surface and a 2D gas of Sb monomers reversibly adsorbs on the (1 x 1) surface. At low temperature (T < 600 degreesC) some impinging Sb-4 molecules act as precursors and can be partially reflected or desorbed while a 2D stable layer of Sb monomers irreversibly adsorbs. The surface continuously shifts from a blurred (7 x 7) surface to a (1 x 1) structure near completion of the 2D layer. In the intermediate range (600degreesC < T < 800 degreesC) provided that the coverage is large enough (theta similar to 2/3) the condensation of the 2D gas leads to a 2D (5root3 x 5root3) reconstruction. We show that introducing the formation of a condensed phase in a kinetics model allows us to reproduce our experimental data. Finally, we determine the adsorption geometry from ab initio calculations: Sb is adsorbed on top positions, somewhat passivating the Si surface dangling bonds. (C) 2003 Elsevier Science B.V. All rights reserved.
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页码:715 / 723
页数:9
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