Kinetics study of antimony adsorption on Si(111)

被引:6
|
作者
Lapena, L [1 ]
Müller, P [1 ]
Quentel, G [1 ]
Guesmi, H [1 ]
Tréglia, G [1 ]
机构
[1] Ctr Rech Mecanismes Croissance Cristalline, F-13288 Marseille 9, France
关键词
adsorption kinetics; reflection high-energy electron (RHEED); ab initio quantum chemical methods and calculations; thermal desorption; antimony; silicon;
D O I
10.1016/S0169-4332(03)00414-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, we use mass spectrometry (MS) and reflection high-energy electron (RHEED) to study the kinetics of adsorption of Sb on Si(1 1 1) surface and its relation to the corresponding surface structure. At high temperature (T > 800 degreesC) all the impinging Sb-4 molecules completely dissociate at the silicon surface and a 2D gas of Sb monomers reversibly adsorbs on the (1 x 1) surface. At low temperature (T < 600 degreesC) some impinging Sb-4 molecules act as precursors and can be partially reflected or desorbed while a 2D stable layer of Sb monomers irreversibly adsorbs. The surface continuously shifts from a blurred (7 x 7) surface to a (1 x 1) structure near completion of the 2D layer. In the intermediate range (600degreesC < T < 800 degreesC) provided that the coverage is large enough (theta similar to 2/3) the condensation of the 2D gas leads to a 2D (5root3 x 5root3) reconstruction. We show that introducing the formation of a condensed phase in a kinetics model allows us to reproduce our experimental data. Finally, we determine the adsorption geometry from ab initio calculations: Sb is adsorbed on top positions, somewhat passivating the Si surface dangling bonds. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:715 / 723
页数:9
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