Narrow band perfect absorber for maximum localized magnetic and electric field enhancement and sensing applications

被引:176
作者
Yong, Zhengdong [1 ]
Zhang, Senlin [1 ]
Gong, Chensheng [1 ]
He, Sailing [1 ,2 ]
机构
[1] Zhejiang Univ, Ctr Opt & Elect Res, State Key Lab Modern Opt Instrumentat, Hangzhou 310058, Zhejiang, Peoples R China
[2] Royal Inst Technol KTH, Sch Elect Engn, Dept Electromagnet Engn, S-10044 Stockholm, Sweden
来源
SCIENTIFIC REPORTS | 2016年 / 6卷
基金
中国国家自然科学基金;
关键词
LIGHT-ABSORPTION; NEGATIVE-INDEX; ANTENNAS; EMISSION;
D O I
10.1038/srep24063
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Plasmonics offer an exciting way to mediate the interaction between light and matter, allowing strong field enhancement and confinement, large absorption and scattering at resonance. However, simultaneous realization of ultra-narrow band perfect absorption and electromagnetic field enhancement is challenging due to the intrinsic high optical losses and radiative damping in metals. Here, we propose an all-metal plasmonic absorber with an absorption bandwidth less than 8 nm and polarization insensitive absorptivity exceeding 99%. Unlike traditional Metal-Dielectric-Metal configurations, we demonstrate that the narrowband perfect absorption and field enhancement are ascribed to the vertical gap plasmonic mode in the deep subwavelength scale, which has a high quality factor of 120 and mode volume of about 10(-4) x (lambda(res)/n)(3). Based on the coupled mode theory, we verify that the diluted field enhancement is proportional to the absorption, and thus perfect absorption is critical to maximum field enhancement. In addition, the proposed perfect absorber can be operated as a refractive index sensor with a sensitivity of 885 nm/RIU and figure of merit as high as 110. It provides a new design strategy for narrow band perfect absorption and local field enhancement, and has potential applications in biosensors, filters and nonlinear optics.
引用
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页数:7
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