Frequency stability of wafer-scale film encapsulated silicon based MEMS resonators

被引:113
作者
Kim, Bongsang
Candler, Rob N.
Hopcroft, Matthew A.
Agarwal, Manu
Park, Woo-Tae
Kenny, Thomas W.
机构
[1] Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
MEMS resonator; long-term stability; resonant frequency stability; encapsulation;
D O I
10.1016/j.sna.2006.10.040
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The stability of resonant frequency for single wafer, thin-film encapsulated silicon MEMS resonators was investigated for both long-term operation and temperature cycling. The resonant frequencies of encapsulated resonators were periodically measured at 25 +/- 0.1 degrees C for > 9000 It, and the resonant frequency variation remained within the measurement uncertainty of 3.1 ppm and 3.8 ppm for the two designs of resonators measured. Also, the resonators were temperature cycled for 680 cycles between -50 degrees C and 80 degrees C, measuring the resonant frequency each time the temperature reached 30 degrees C. Again, the change in resonant frequency was seen to remain within the measurement uncertainty. This demonstrates stability of resonant frequency for both long-term operation of more than a year and large number of temperature cycles, emphasizing the stability of both the resonator and the package. (C) 2006 Published by Elsevier B.V.
引用
收藏
页码:125 / 131
页数:7
相关论文
共 20 条
[1]  
AGARWAL A, 2006, P 18 IEEE INT C MICR, P154
[2]  
CANDLER R, 2003, P IEEE T ADV PACK AU, P227
[3]  
Guckel H., 1992, Technical Digest. IEEE Solid-State Sensor and Actuator Workshop (Cat. No.92TH0403-X), P153, DOI 10.1109/SOLSEN.1992.228303
[4]   Dynamic fatigue of silicon [J].
Kahn, H ;
Ballarini, R ;
Heuer, AH .
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 2004, 8 (01) :71-76
[5]  
KHAN H, 2002, SCIENCE, V298, P1215
[6]  
KIM B, 2004, ASME INT MECH ENG C
[7]   Long-term stability of single-crystal silicon microresonators [J].
Koskenvuori, M ;
Mattila, T ;
Häärä, A ;
Kiihamäki, J ;
Tittonen, I ;
Oja, A ;
Seppä, H .
SENSORS AND ACTUATORS A-PHYSICAL, 2004, 115 (01) :23-27
[8]   HYSTERESIS IN QUARTZ RESONATORS - A REVIEW [J].
KUSTERS, JA ;
VIG, JR .
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 1991, 38 (03) :281-290
[9]   Fatigue of polycrystalline silicon for microelectromechanical system applications: crack growth and stability under resonant loading conditions [J].
Muhlstein, CL ;
Howe, RT ;
Ritchie, RO .
MECHANICS OF MATERIALS, 2004, 36 (1-2) :13-33
[10]   High-cycle fatigue of micron-scale polycrystalline silicon films: fracture mechanics analyses of the role of the silica/silicon interface [J].
Muhlstein, CL ;
Ritchie, RO .
INTERNATIONAL JOURNAL OF FRACTURE, 2003, 119 (4-2) :449-474