Stable integration of isolated cell membrane patches in a nanomachined aperture

被引：63

作者：

Fertig, N

Tilke, A

Blick, RH

Kotthaus, JP

Behrends, JC

ten Bruggencate, G

机构：

[1] Univ Munich, Ctr Nanosci, D-80539 Munich, Germany

[2] Univ Munich, Sekt Phys, D-80539 Munich, Germany

[3] Univ Munich, Inst Physiol, D-803369 Munich, Germany

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 08期

关键词：

D O I：

10.1063/1.1289490

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a method for integrating an isolated cell membrane patch into a semiconductor device. The semiconductor is nanostructured for probing native cell membranes for scanning probe microscopy in situ. Apertures were etched into suspended silicon-nitride layers on a silicon substrate using standard optical lithography as well as electron-beam lithography in combination with reactive ion etching. Apertures of 1 mu m diam were routinely fabricated and a reduction in size down to 50 nm was achieved. The stable integration of cell membranes was verified by confocal fluorescence microscopy in situ. (C) 2000 American Institute of Physics. [S0003-6951(00)01834-9].

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页码：1218 / 1220

页数：3

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