First-principles simulations on bulk Ta2O5 and Cu/Ta2O5/Pt heterojunction: Electronic structures and transport properties

被引:55
作者
Gu, Tingkun [1 ]
Wang, Zhongchang [1 ]
Tada, Tomofumi [1 ]
Watanabe, Satoshi [1 ]
机构
[1] Univ Tokyo, Dept Mat Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
TOTAL-ENERGY CALCULATIONS; WAVE BASIS-SET; MEMORY APPLICATIONS; TANTALUM PENTOXIDE; OXIDE; RESISTANCE; SYSTEM; SEMICONDUCTORS; INTERFACES; ADHESION;
D O I
10.1063/1.3260244
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electronic structures and transport properties of bulk Ta2O5 and Cu/Ta2O5/Pt heterojunction have been studied from first principles. Of the two room-temperature phases of bulk Ta2O5, beta-, and delta-Ta2O5, our calculated results showed that the beta phase has much narrower band gap than the delta-Ta2O5. For Cu/delta-Ta2O5/Pt heterojunction, the p-type Schottky barriers between the Cu (Pt) and Ta2O5 were estimated as 0.9-1.2 eV. Both the standard density-functional calculation and the nonequilibrium Green's function showed that no conducting channels were formed from Cu to Pt through delta-Ta2O5. (C) 2009 American Institute of Physics. [doi:10.1063/1.3260244]
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页数:8
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