Intrinsic Ferroelasticity and/or Multiferroicity in Two-Dimensional Phosphorene and Phosphorene Analogues

被引:573
作者
Wu, Menghao [1 ,2 ]
Zeng, Xiao Cheng [3 ,4 ]
机构
[1] Huazhong Univ Sci & Technol, Sch Phys, Wuhan 430074, Peoples R China
[2] Huazhong Univ Sci & Technol, Wuhan Natl High Magnet Field Ctr, Wuhan 430074, Peoples R China
[3] Univ Nebraska, Dept Chem, Lincoln, NE 68588 USA
[4] Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
基金
美国国家科学基金会; 中国国家自然科学基金;
关键词
phosphorene and phosphorene analogues; ferroelasticity; ferroelectricity; first-principles calculation; anisotropic reading; TOTAL-ENERGY CALCULATIONS; LAYER BLACK PHOSPHORUS; WAVE BASIS-SET; SNSE; MOBILITY; SEMICONDUCTORS; EFFICIENCY; ANISOTROPY; TRANSPORT; POINTS;
D O I
10.1021/acs.nanolett.6b00726
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Phosphorene and phosphorene analogues such as SnS and SnSe monolayers are promising nanoelectronic materials with desired bandgap, high carrier mobility, and anisotropic structures. Here, we show first-principles calculation evidence that these monolayers are potentially the long-sought two-dimensional (2D) materials that can combine electronic transistor characteristic with nonvolatile memory readable/writeable capability at ambient condition. Specifically, phosphorene is predicted to be a 2D intrinsic ferroelastic material with ultrahigh reversible strain, whereas SnS, SnSe, GeS, and GeSe monolayers are multiferroic with coupled ferroelectricity and ferroelasticity. Moreover, their low-switching barriers render room-temperature nonvolatile memory accessible, and their notable structural anisotropy enables ferroelastic or ferroelectric switching readily readable via electrical, thermal, optical, mechanical, or even spintronic detection upon the swapping of the zigzag and armchair direction. In addition, it is predicted that the GeS and GeSe monolayers as well as bulk SnS and SnSe can maintain their ferroelasticity and ferroelectricity (anti-ferroelectricity) beyond the room temperature, suggesting high potential for practical device application.
引用
收藏
页码:3236 / 3241
页数:6
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