Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry

被引：31

作者：

Li, Weiqi ^{[1
]}

Zhang, Chuanwei ^{[1
,2
]}

Jiang, Hao ^{[1
]}

Chen, Xiuguo ^{[1
]}

Liu, Shiyuan ^{[1
,2
]}

机构：

[1] Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Peoples R China

[2] Wuhan Eopt Technol Co Ltd, Wuhan 430075, Peoples R China

来源：

JOURNAL OF OPTICS | 2016年 / 18卷 / 05期

基金：

中国国家自然科学基金;

关键词：

depolarization; dual rotating-compensator; Mueller matrix ellipsometry; finite bandwidth; correction; measurement accuracy; CALIBRATION; POLARIMETRY; ERRORS;

D O I：

10.1088/2040-8978/18/5/055701

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Noticeable depolarization effects are observed in the measurement of the air using an in-house developed dual rotating-compensator Mueller matrix ellipsometer. We demonstrate that these depolarization effects are essentially artifacts and mainly induced when the compensator with wavelength-dependent optical properties is integrated with the finite bandwidth detector. We define a general formula to represent the actual Mueller matrix of the compensator by taking into account the depolarization artifacts. After incorporating this formula into the system model, a correction method is further proposed, and consequently, improved accuracy can be achieved in the Mueller matrix measurement.

引用

页数：7

共 21 条

[1]

Azzam R. M. A., 1977, Ellipsometry and polarized light

[2] Optical anisotropies of single-meander plasmonic metasurfaces analyzed by Mueller matrix spectroscopy [J].

Berrier, Audrey ;

Gompf, Bruno ;

Fu, Liwei ;

Weiss, Thomas ;

Schweizer, Heinz .

PHYSICAL REVIEW B, 2014, 89 (19)

[3] Systematic errors for a Mueller matrix dual rotating compensator ellipsometer [J].

Broch, Laurent ;

Naciri, Aotmane En ;

Johann, Luc .

OPTICS EXPRESS, 2008, 16 (12) :8814-8824

[4] Multichannel Mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors [J].

Chen, C ;

An, I ;

Collins, RW .

PHYSICAL REVIEW LETTERS, 2003, 90 (21) :4-217402

[5] Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry [J].

Chen, Xiuguo ;

Liu, Shiyuan ;

Zhang, Chuanwei ;

Jiang, Hao ;

Ma, Zhichao ;

Sun, Tangyou ;

Xu, Zhimou .

OPTICS EXPRESS, 2014, 22 (12) :15165-15177

[6] Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry [J].

Chen, Xiuguo ;

Zhang, Chuanwei ;

Liu, Shiyuan .

APPLIED PHYSICS LETTERS, 2013, 103 (15)

[7] Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films [J].

Collins, RW ;

Koh, J .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1999, 16 (08) :1997-2006

[8] Characterization of grating structures by Mueller polarimetry in presence of strong depolarization due to finite spot size [J].

Foldyna, M. ;

De Martino, A. ;

Ossikovski, R. ;

Garcia-Caurel, E. ;

Licitra, C. .

OPTICS COMMUNICATIONS, 2009, 282 (05) :735-741

[9]

Fujiwara H., 2009, SPECTROSCOPIC ELLIPS

[10] Effect of Bandwidth and Numerical Aperture in Optical Scatterometry [J].

Germer, Thomas A. ;

Patrick, Heather J. .

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV, 2010, 7638

← 1 2 3 →