Large surface profile measurement with instantaneous phase-shifting interferometry

被引：38

作者：

Sivakumar, NR ^{[1
]}

Hui, WK ^{[1
]}

Venkatakrishnan, K ^{[1
]}

Ngoi, BKA ^{[1
]}

机构：

[1] Nanyang Technol Univ, Precis Engn & Nanotechnol Ctr, Sch Mech & Prod Engn, Singapore 639798, Singapore

来源：

OPTICAL ENGINEERING | 2003年 / 42卷 / 02期

关键词：

large surface profile measurement; phase shifting; modified Michelson interferometer; instantaneous phase shifting;

D O I：

10.1117/1.1532331

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Surface profile measurement of smooth surfaces is a vital area in many of today's industries, especially in wafer fabrication. The increased need for high-speed, noncontact online measurement with high accuracy and repeatability is of great interest for practical purposes. In this work, a modification of Michelson interferometers in combination with instantaneous phase-shifting interferometry is proposed for highspeed large flat-surface profiling. Experiments are carried out on a patterned wafer surface. The results obtained using this system are compared with a commercial profiler system to demonstrate the validity of the principle. (C) 2003 Society of Photo-Optical Instrumentation Engineers.

引用

页码：367 / 372

页数：6

共 17 条

[1] COMPARISON OF TECHNIQUES FOR MEASURING THE ROUGHNESS OF OPTICAL-SURFACES [J].