The APCVD of tungsten oxide thin films from reaction of WCl6 with ethanol and results on their gas-sensing properties

被引：31

作者：

Ashraf, Sobia ^{[1
]}

Binions, Russell ^{[1
]}

Blackman, Christopher S. ^{[1
]}

Parkin, Ivan P. ^{[1
]}

机构：

[1] UCL, Dept Chem, Christopher Ingold Labs, London WC1H 0AJ, England

来源：

POLYHEDRON | 2007年 / 26卷 / 07期

基金：

英国工程与自然科学研究理事会;

关键词：

CVD; GAS sensing; tungsten oxide;

D O I：

10.1016/j.poly.2006.11.017

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

The APCVD reaction Of WCl6 with ethanol was examined to deposit tungsten oxide on gas sensor substrates. Deposited films, which were WO3-x, displayed a different morphology than those seen previously for CVD tungsten oxide. The gas-sensing properties of the deposited films were examined. (C) 2006 Elsevier Ltd. All rights reserved.

引用

页码：1493 / 1498

页数：6

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