Surface modification using ionic liquid ion beams

被引：1

作者：

Takaoka, Gikan H. ^{[1
]}

Hamaguchi, Takuya ^{[1
]}

Takeuchi, Mitsuaki ^{[1
]}

Ryuto, Hiromichi ^{[1
]}

机构：

[1] Kyoto Univ, Photon & Elect Sci & Engn Ctr, Nishikyo Ku, Kyoto 6158510, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2014年 / 341卷

基金：

日本学术振兴会;

关键词：

Cluster ions; Ionic liquid ions; Polyatomic ions; Ion beams; Surface modification; SOLID-SURFACES; CLUSTER IONS; IRRADIATION; DEPOSITION;

D O I：

10.1016/j.nimb.2014.06.030

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We developed an ionic liquid (IL) ion source using 1-butyl-3-methylimidazolium hexafluorophosphate (BMIM-PF6) and produced IL ion beams by applying a high electric field between the tip and the extractor. Time-of-flight measurements showed that small cluster and fragment ions were contained in the positive and negative ion beams. The positive and negative cluster ions were deposited on Si(100) substrates. Xray photoelectron spectroscopy measurements showed that the composition of the deposited layers was similar to that of an IL solvent. This suggests that a cation (A(+)) or an anion (B-) was attached to an IL cluster (AB), resulting in the formation of positive cluster ions (AB)(n)A(+) or negative cluster ions (AB)B, respectively. The surfaces of the IL layers deposited on Si(1 00) substrates were flat at an atomic level for positive and negative cluster ion irradiation. Moreover, the contact angles of the deposited layers were similar to that of the IL solvent. Thus, surface modification of Si(100) substrates was successfully demonstrated with BMIM-PF6 cluster ion beams. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：32 / 36

页数：5

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