Growth of bulk GaN with low dislocation density by the ammonothermal method using polycrystalline GaN nutrient

被引:11
|
作者
Hashimoto, Tadao [1 ]
Wu, Fen. Z.
Speck, James S.
Nakamura, Shuji
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, UCSB Grp, ERATO, JST, Santa Barbara, CA 93106 USA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 20-24期
关键词
bulk GaN; ammenothermal growth; dislocations; etch pit density;
D O I
10.1143/JJAP.46.L525
中图分类号
O59 [应用物理学];
学科分类号
摘要
A bulk GaN crystal with improved structural quality was grown via ammonthermal growth with polycrystalline GaN nutrient and a sodium amide mineralize-. The threading dislocation density estimated by plan-view transmission electron microscopy observations was less than 1 X 10(6) cm(-2) for the Ga-face and 1 X 10(7)cm(-2) for the N-face. There was no dislocation generation observed at the interface on the Ga-face although a few defects were generated at the interface on the N-face. The chemical etching revealed macroscopic grains on the N-face.
引用
收藏
页码:L525 / L527
页数:3
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