Electron wave interference induced by electrons emitted from Pt field emitter fabricated by focused-ion-beam-induced deposition

被引：3
作者：
Murakami, K. [1 ]
Matsuo, T. [2 ]
Wakaya, F. [1 ,2 ]
Takai, M. [1 ,2 ]
机构：
[1] Osaka Univ, Ctr Quantum Sci & Technol Extreme Condit, Osaka 5608531, Japan
[2] Osaka Univ, Grad Sch Engn Sci, Osaka 5608531, Japan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 02期
关键词：
electromagnetic wave interference; electron field emission; field emission ion microscopy; nanostructured materials; nanotechnology; platinum; EMISSION PATTERN; HOLOGRAPHY;
D O I：
10.1116/1.3333440
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Fringelike electron emission patterns emitted from Pt field emitters fabricated by focused-ion-beam-induced deposition (FIBID) were investigated by field-emission microscopy and in situ field-ion microscopy (FIM). The FIM image with electron emission sites showed adjacent two emission sites within a diameter of a Pt nanocrystal. These results indicate that the origin of fringelike electron emission patterns of Pt field emitters fabricated by FIBID are the electron wave interference induced by electrons emitted from adjacent two electron emission sites within a Pt nanocrystal.
引用
收藏
页码：C2A9 / C2A12
页数：4
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