Mechanical characterization of ultra-thin fluorocarbon films deposited by RF magnetron sputtering

被引:40
|
作者
Tang, GZ
Ma, XX
Sun, MR
Li, XD
机构
[1] Univ S Carolina, Dept Mech Engn, Columbia, SC 29208 USA
[2] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China
基金
美国国家科学基金会;
关键词
carbon films; mechanical properties; surface properties;
D O I
10.1016/j.carbon.2004.09.022
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Fluorocarbon films were deposited on silicon substrate by R.F. magnetron sputtering using a polytetrafluoroethylene (PTFE) target. Structure of the deposited films was studied by X-ray photoelectron spectroscopy (XPS). Hardness, elastic modulus and scratch resistance were measured using a nanoindenter with scratch capability. -CFx (x = 1, 2, 3) and C-C units were found in the deposited fluorocarbon films. The hardness and elastic modulus of the films are strongly dependent on the R.F. power and deposition pressure. The film hardness is in the range from 0.8GPa to 1.3GPa while the film elastic modulus is in the range from 8GPa to 18GPa. Harder films exhibit higher scratch resistance. Differences in nanoindentation behavior between the deposited fluorocarbon films, diamond-like carbon (DLC) films and PTFE were discussed. The fluorocarbon films should find more applications in the magnetic storage and micro/nanoelectromechanical systems. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:345 / 350
页数:6
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