共 19 条
Nonpolar resistive switching in the Pt/MgO/Pt nonvolatile memory device
被引:106
作者:

Huang, Hsin-Hung
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan

Shih, Wen-Chieh
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan

论文数: 引用数:
h-index:
机构:
机构:
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
关键词:
Auger electron spectra;
electrical conductivity transitions;
electrical resistivity;
magnesium compounds;
MIM devices;
platinum;
random-access storage;
thin films;
X-ray photoelectron spectra;
THIN-FILMS;
D O I:
10.1063/1.3429024
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Nonpolar resistive switching (RS), which is the coexistence of unipolar and bipolar RS characteristics, in the Pt/MgO/Pt memory device with the nonforming nature is demonstrated. The nonforming nature is ascribed to the relatively high defect density of the MgO film deposited by using the ion beam sputtering in Ar atmosphere. The results of Auger electron spectroscopy and x-ray photoelectron spectroscopy analyses combing with the temperature dependence of resistance suggest that metallic Mg filaments are formed in the low resistance state. The voltage-polarity-independent RESET process implies that filaments may be ruptured by local Joule heating, leading to nonpolar characteristics. (C) 2010 American Institute of Physics. [doi:10.1063/1.3429024]
引用
收藏
页数:3
相关论文
共 19 条
- [1] Spatially resolved electron energy-loss spectroscopy of electron-beam grown and sputtered CoFeB/MgO/CoFeB magnetic tunnel junctions[J]. APPLIED PHYSICS LETTERS, 2007, 91 (06)Cha, Judy J.论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USARead, J. C.论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USABuhrman, R. A.论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USAMuller, David A.论文数: 0 引用数: 0 h-index: 0机构: Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA
- [2] Random circuit breaker network model for unipolar resistance switching[J]. ADVANCED MATERIALS, 2008, 20 (06) : 1154 - +Chae, Seung Chul论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaLee, Jae Sung论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaKim, Sejin论文数: 0 引用数: 0 h-index: 0机构: Kookmin Univ, Sch Adv Mat Engn, Ctr Mat & Proc Self Assembly, Seoul 136702, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaLee, Shin Buhm论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaChang, Seo Hyoung论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaLiu, Chunli论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaKahng, Byungnam论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaShin, Hyunjung论文数: 0 引用数: 0 h-index: 0机构: Kookmin Univ, Sch Adv Mat Engn, Ctr Mat & Proc Self Assembly, Seoul 136702, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaKim, Dong-Wook论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Appl Phys, Ansan 426791, Gyeonggi Do, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaJung, Chang Uk论文数: 0 引用数: 0 h-index: 0机构: Hankuk Univ Foreign Studies, Dept Phys, Yongin 449791, Gyeonggi Do, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South KoreaSeo, Sunae论文数: 0 引用数: 0 h-index: 0机构: Samsung Adv Inst Technol, Suwon 440600, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea论文数: 引用数: h-index:机构:Noh, Tae Won论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea Seoul Natl Univ, Dept Phys & Astron, ReCOE & FPRD, Seoul 151747, South Korea
- [3] 230% room-temperature magnetoresistance in CoFeB/MgO/CoFeB magnetic tunnel junctions[J]. APPLIED PHYSICS LETTERS, 2005, 86 (09) : 1 - 3Djayaprawira, DD论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanTsunekawa, K论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanNagai, M论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanMaehara, H论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanYamagata, S论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanWatanabe, N论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanYuasa, S论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanSuzuki, Y论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, JapanAndo, K论文数: 0 引用数: 0 h-index: 0机构: Anelva Corp, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan
- [4] Hysteretic current-voltage characteristics and resistance switching at an epitaxial oxide Schottky junction SrRuO3/SrTi0.99Nb0.01O3[J]. APPLIED PHYSICS LETTERS, 2005, 86 (01) : 012107 - 1论文数: 引用数: h-index:机构:Kawasaki, M论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanSawa, A论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, Japan Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanAkoh, H论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanKawazoe, Y论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, Japan论文数: 引用数: h-index:机构:
- [5] On the resistive switching mechanisms of Cu/ZrO2:Cu/Pt[J]. APPLIED PHYSICS LETTERS, 2008, 93 (22)Guan, Weihua论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R China Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R ChinaLiu, Ming论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R China Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R ChinaLong, Shibing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R China Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R ChinaLiu, Qi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R China Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R ChinaWang, Wei论文数: 0 引用数: 0 h-index: 0机构: SUNY Albany, CNSE, Albany, NY 12203 USA Chinese Acad Sci, Lab Nanofabricat & Novel Device Integrat, Inst Microelect, Beijing 100029, Peoples R China
- [6] Room-temperature fabricated ZnCoO diluted magnetic semiconductors[J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (09)Huang, Hsin-Hung论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, TaiwanYang, Chih-An论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, TaiwanHuang, Po-Hsiang论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan论文数: 引用数: h-index:机构:Chin, T. S.论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, TaiwanHuang, H. E.论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, TaiwanBor, H. Y.论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, TaiwanHuang, R. T.论文数: 0 引用数: 0 h-index: 0机构: Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
- [7] Nonpolar resistance switching of metal/binary-transition-metal oxides/metal sandwiches: Homogeneous/inhomogeneous transition of current distribution[J]. PHYSICAL REVIEW B, 2008, 77 (03)Inoue, I. H.论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, Japan Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanYasuda, S.论文数: 0 引用数: 0 h-index: 0机构: NRI, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanAkinaga, H.论文数: 0 引用数: 0 h-index: 0机构: NRI, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, JapanTakagi, H.论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, Japan Univ Tokyo, Dept Adv Mat, Kashiwa, Chiba 2778581, Japan Natl Inst Adv Ind Sci & Technol, CERC, Tsukuba, Ibaraki 3058562, Japan
- [8] Nanoscale resistive memory with intrinsic diode characteristics and long endurance[J]. APPLIED PHYSICS LETTERS, 2010, 96 (05)Kim, Kuk-Hwan论文数: 0 引用数: 0 h-index: 0机构: Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USAJo, Sung Hyun论文数: 0 引用数: 0 h-index: 0机构: Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USAGaba, Siddharth论文数: 0 引用数: 0 h-index: 0机构: Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USALu, Wei论文数: 0 引用数: 0 h-index: 0机构: Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
- [9] Memristive switching of MgO based magnetic tunnel junctions[J]. APPLIED PHYSICS LETTERS, 2009, 95 (11)Krzysteczko, Patryk论文数: 0 引用数: 0 h-index: 0机构: Univ Bielefeld, Thin Films & Phys Nanostruct, D-33615 Bielefeld, Germany Univ Bielefeld, Thin Films & Phys Nanostruct, D-33615 Bielefeld, GermanyReiss, Guenter论文数: 0 引用数: 0 h-index: 0机构: Univ Bielefeld, Thin Films & Phys Nanostruct, D-33615 Bielefeld, Germany Univ Bielefeld, Thin Films & Phys Nanostruct, D-33615 Bielefeld, Germany论文数: 引用数: h-index:机构:
- [10] Electrical Manipulation of Nanofilaments in Transition-Metal Oxides for Resistance-Based Memory[J]. NANO LETTERS, 2009, 9 (04) : 1476 - 1481论文数: 引用数: h-index:机构:Han, Seungwu论文数: 0 引用数: 0 h-index: 0机构: Ewha Womans Univ, Dept Phys, Seoul 120750, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaJeon, Sang Ho论文数: 0 引用数: 0 h-index: 0机构: Konkuk Univ, Div Quantum Phases & Devices, Sch Phys, Seoul 143701, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaPark, Bae Ho论文数: 0 引用数: 0 h-index: 0机构: Konkuk Univ, Div Quantum Phases & Devices, Sch Phys, Seoul 143701, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaKang, Bo Soo论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaAhn, Seung-Eon论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea论文数: 引用数: h-index:机构:Lee, Chang Bum论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaKim, Chang Jung论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaYoo, In-Kyeong论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaSeo, David H.论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Mat Sci & Engn, Palo Alto, CA 94305 USA Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaLi, Xiang-Shu论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaPark, Jong-Bong论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaLee, Jung-Hyun论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaPark, Youngsoo论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea